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Study on the electronic structure and optical properties of TiN films based on the first-principle

机译:基于第一原理的锡膜的电子结构和光学性能研究

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摘要

Base on the first-principles, the energy band and optical properties of TiN thin films were modeled by the materials studio (MS) programm. The energy band, total density of states (DOS), dielectric function, absorption and reflectivity of TiN were studied. The results suggested that the Fermi energy (E-F) passes through the energy band with dense distribution of energy levels, moreover, the total density of states crosses the E-F, suggested that TiN belongs to metalloid, and determined by electronics in Ti-3d state. Meanwhile, the structure of energy band was affected by pressure, but the influence of temperatures is weak. The reflectivity of TiN to red light (1.63 eV to 1.97 eV) is lower than that of blue light (2.53 eV to 2.75 eV). Moreover, TiN has a higher reflectance in the infrared region, and showed translucent in the visible light region and the static permittivity of TiN is about 39.24 F/m.
机译:基于第一原理的基础,由材料工作室(MS)编程模拟锡薄膜的能带和光学性质。 研究了能源带,锡的总密度(DOS),介质功能,吸收和反射率。 结果表明,费米能量(E-F)通过能量水平致密分布的能量带,而且各州的总密度交叉,建议锡属于金属体,并通过Ti-3D状态的电子确定。 同时,能带的结构受压力的影响,但温度的影响弱。 锡对红光的反射率(1.63eV至1.97eV)低于蓝光(2.53eV至2.75eV)。 此外,锡在红外区域中具有更高的反射率,并且在可见光区域中显示出半透明,锡的静电介电常数为约39.24f / m。

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