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首页> 外文期刊>Physical chemistry chemical physics: PCCP >Highly branched triple-chain surfactant-mediated electrochemical exfoliation of graphite to obtain graphene oxide: colloidal behaviour and application in water treatment
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Highly branched triple-chain surfactant-mediated electrochemical exfoliation of graphite to obtain graphene oxide: colloidal behaviour and application in water treatment

机译:高度分枝的三链表面活性剂介导的石墨电化学剥离,得到石墨烯氧化物:胶体行为和水处理中的应用

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摘要

The generation of surfactant-assisted exfoliated graphene oxide (sEGO) by electrochemical exfoliation is influenced by the presence of surfactants, and in particular the hydrophobic tail molecular-architecture. Increasing surfactant chain branching may improve the affinity for the graphite surfaces to provide enhanced intersheet separation and stabilisation of exfoliated sheets. The resulting sEGO composites can be readily used to remove of a model pollutant, the dye, methylene blue (MB), from aqueous solutions by providing abundant sites for dye adsorption. This article explores relationships between surfactant structure and the performance of sEGO for MB adsorption. Double-branched and highly branched triple-chain graphene-compatible surfactants were successfully synthesised and characterised by(1)H NMR spectroscopy. These surfactants were used to produce sEGOviaelectrochemical exfoliation of graphite, and the sEGOs generated were further utilised in batch adsorption studies of MB from aqueous solutions. The properties of these synthesised surfactants were compared with those of a common single-chain standard surfactant, sodium dodecyl-sulfate (SDS). The structural morphology of sEGO was assessed using Raman spectroscopy and field emission scanning electron microscopy (FESEM). To reveal the links between the hydrophobic chain structure and the sEGO adsorption capacity, UV-visible spectroscopy, zeta potential, and air-water (a/w) surface tension measurements were conducted. The aggregation behaviour of the surfactants was studied using small-angle neutron scattering (SANS). The highly branched triple-chain surfactant sodium 1,4-bis(neopentyloxy)-3-(neopentylcarbonyl)-1,4-dioxobutane-2-sulfonate (TC14) displayed enhanced exfoliating efficiency compared to those of the single-and double-chain surfactants, leading to similar to 83% MB removal. The findings suggest that highly branched triple-chain surfactants are able to offer more adsorption sites, by expanding the sEGO interlayer gap for MB adsorption, compared to standard single-chain surfactants.
机译:通过电化学剥离产生表面活性剂辅助的剥离的石墨烯氧化物(SEGO)受表面活性剂的存在,特别是疏水性尾部分子结构的影响。增加表面活性剂链支链可以改善石墨表面的亲和力,以提供增强的剥离片的分离和稳定化。通过提供丰富的染料吸附的诸如染料,可以容易地用于从水溶液中除去模型污染物,染料,亚甲基蓝(Mb)的模型污染物。本文探讨了表面活性剂结构与SEGO对MB吸附性能之间的关系。通过(1)H NMR光谱成功合成双支化和高度分支三链石墨烯 - 相容性表面活性剂,其特征在于(1)H NMR光谱。这些表面活性剂用于产生石墨的Segovia电化学剥离,并进一步用于来自水溶液的MB的分批吸附研究的SEGOS。将这些合成表面活性剂的性质与普通单链标准表面活性剂,十二烷基 - 硫酸钠(SDS)进行比较。使用拉曼光谱和场发射扫描电子显微镜(FeSEM)评估SEGO的结构形态。为了揭示疏水链结构与SEGO吸附能力之间的链接,进行UV可见光谱,Zeta电位和空气 - 水(A / W)表面张力测量。使用小角度中子散射(SAN)研究了表面活性剂的聚集行为。与单链和双链相比,高分支三链表面活性剂钠1,4-双(新戊氧基)-3-(新戊氧基)-3-(新戊氧基)-3-(新戊氧基)-3-(新戊基羰基)-1,4-二氧丁基 - 2-磺酸盐(TC14)显示出增强的去角质效率表面活性剂,导致类似于83%的MB去除。结果表明,与标准单链表面活性剂相比,高度分枝的三链表面活性剂能够通过扩大SEGO interlayer间隙来提供更多的吸附位点。

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    Univ Pendidikan Sultan Idris Fac Sci &

    Math Dept Chem Tanjong Malim 35900 Perak Malaysia;

    Univ Pendidikan Sultan Idris Fac Sci &

    Math Dept Chem Tanjong Malim 35900 Perak Malaysia;

    Univ Pendidikan Sultan Idris Fac Sci &

    Math Nanotechnol Res Ctr Tanjong Malim 35900 Perak Malaysia;

    Univ Pendidikan Sultan Idris Fac Sci &

    Math Dept Chem Tanjong Malim 35900 Perak Malaysia;

    Hirosaki Univ Grad Sch Sci &

    Technol Dept Frontier Mat Chem Bunkyo Cho 3 Hirosaki Aomori 0368561 Japan;

    Hirosaki Univ Grad Sch Sci &

    Technol Dept Frontier Mat Chem Bunkyo Cho 3 Hirosaki Aomori 0368561 Japan;

    Univ Teknol MARA UiTM Fac Elect Engn NANOElecT Ctr NET Shah Alam 40450 Selangor Malaysia;

    Univ Tun Hussein Onn Malaysia Fac Elect &

    Elect Engn Microelect &

    Nanotechnol Shamsuddin Res Ctr MiNT Batu Pahat 86400 Johor Malaysia;

    STFC Rutherford Appleton Lab ISIS Pulsed Neutron &

    Muon Source Harwell Campus Didcot OX11 0QL Oxon England;

    STFC Rutherford Appleton Lab ISIS Pulsed Neutron &

    Muon Source Harwell Campus Didcot OX11 0QL Oxon England;

    Univ Bristol Sch Chem Cantocks Close Bristol BS8 1TS Avon England;

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  • 正文语种 eng
  • 中图分类 物理学;化学;
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