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X-Ray diffraction and resonance shear measurement of nano-confined ionic liquids

机译:纳米密闭离子液体的X射线衍射和共振剪切测量

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X-ray diffraction measurement at the SPring-8 synchrotron was employed to investigate the structures of two types of imidazolium-based ionic liquids (ILs), 1-butyl-3-methylimidazolium bis(trifluoromethanesulfonyl) imide ([C4mim][NTF2]) and 1-butyl-3-methylimidazolium tetrafluoroborate ([C4mim][BF4]), confined between silica surfaces by varying the surface separation distances of ca. 500 nm (bulk liquid), ca. 10 nm, and ca. 2 nm (hard wall thickness). The obtained diffraction profiles and intensities were discussed by considering the structures and properties of the nano-confined ILs between the silica surfaces investigated by resonance shear measurement (RSM) and molecular dynamics simulation (MD) in our previous reports. [C4mim][NTf2] showed two diffraction peaks at q = 8.8 nm(-1) (spacing d = 0.71 nm) and at q = 14.0 nm(-1) (spacing d = 0.45 nm) at the greatest distance (D = ca. 500 nm), which were assigned to the interval between the same ions (anion-anion or cation-cation) within the polar network of [C4mim][NTf2] and the interval between the neighboring anion-cation, respectively. The positions of these two peaks remained the same at D = ca. 10 nm and at the hard wall (D = ca. 2 nm) and their intensity factor increased, indicating that both the cation and anion existed in the same layer. This result was consistent with the checkerboard structure of [C4mim][NTf2] on the silica surface computer simulated in our previous studies. On the other hand, [C4mim][BF4] showed a peak at q = 15.4 nm(-1) (spacing d = 0.41 nm) corresponding to the anion-cation interval at the greatest distance (D = ca. 500 nm). This peak became broader and weaker at D = ca. 12 nm and at D = ca. 2 nm.
机译:采用弹簧-8同步rotron的X射线衍射测量来研究两种类型的基于咪唑鎓离子液体(ILS),1-丁基-3-甲基咪唑鎓双(三氟甲磺酰基)酰亚胺([C4MIM] [NTF2])的结构通过改变CA的表面分离距离,在二氧化硅表面之间限制了1-丁基-3-甲基咪唑鎓四氟硼酸盐([C4mim] [BF4])。 500 nm(散装液体),ca. 10 nm和ca. 2 nm(硬壁厚)。通过考虑通过在我们之前的报告中通过共振剪切测量(RSM)和分子动力学模拟(MD)研究的二氧化硅表面之间的纳米孔表面和分子动力学模拟(MD)之间的纳米限制ILS的结构和性质来讨论获得的衍射谱和强度。 [C4mim] [NTF2]在最大距离处显示Q = 8.8nm(-1)(间距d = 0.71nm)的两个衍射峰(间隔d = 0.71nm)和q = 14.0nm(-1)(间隔d = 0.45nm)(d = CA. 500nm),分别分配给[C4mim] [NTF2]极性网络内的相同离子(阴离子 - 阴离子或阳离子)之间的间隔和相邻阴离子阳离子之间的间隔。 D = CA的这两个峰的位置仍然相同。在硬墙(D = Ca.2nm)和它们的强度因子增加10nm和处于硬壁,表明阳离子和阴离子都存在于同一层中。该结果与在我们以前的研究中模拟的二氧化硅表面计算机上的[C4mim] [NTF2]的棋盘结构一致。另一方面,[C4mim] [BF4]在最大距离(D = CA.500nm)处,对应于对应于阴离子阳离子间隔的Q = 15.4nm(-1)(间隔d = 0.41nm)的峰值。这个峰值变得更加越来越弱,在d = ca. 12 nm和d = ca. 2纳米。

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    Tohoku Univ Inst Multidisciplinary Res Adv Mat Aoba Ku Katahira 2-1-1 Sendai Miyagi 9808577 Japan;

    Tohoku Univ Inst Multidisciplinary Res Adv Mat Aoba Ku Katahira 2-1-1 Sendai Miyagi 9808577 Japan;

    Tohoku Univ Inst Multidisciplinary Res Adv Mat Aoba Ku Katahira 2-1-1 Sendai Miyagi 9808577 Japan;

    Japan Synchrotron Radiat Res Inst SPring 8 Sayo Hyogo 6795198 Japan;

    Japan Synchrotron Radiat Res Inst SPring 8 Sayo Hyogo 6795198 Japan;

    Tohoku Univ Inst Multidisciplinary Res Adv Mat Aoba Ku Katahira 2-1-1 Sendai Miyagi 9808577 Japan;

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  • 正文语种 eng
  • 中图分类 物理学;化学;
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