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Tuning the electronic structure properties of MoS2 monolayers with carbon doping

机译:用碳掺杂调整MOS2单层的电子结构特性

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The structural and electronic properties of MoS2 sheets doped with carbon line domains are theoretically investigated through density functional theory calculations. It is primarily studied how the system's electronic properties change when different domain levels are considered. These changes are also reflected in the geometry of the system, which acquires new properties when compared to the pristine structure. We predict, both qualitative and quantitatively, how the energy gap changes as a function of domain types. Strikingly, the band structure for the doped system shows semiconducting behavior with an indirect-bandgap, which is narrower than the one for bulk MoS2. This is an important feature as far as gap tuning engineering is concerned. It has a profound impact on the applicability of these systems in electronic devices, where an indirect bandgap favors the quantum yield efficiency.
机译:通过密度泛函理论计算理论上研究了掺杂有碳线结构域的MOS2片材的结构和电子性质。 主要研究了系统的电子特性如何在考虑不同的域级别时如何变化。 这些变化也反映在系统的几何形状中,其与原始结构相比时获得新的性质。 我们预测,定性和定量地,能量差距如何随着域类型的函数而变化。 尖锐地,掺杂系统的带结构示出了具有间接带隙的半导体行为,其比散装MOS2更窄。 这是差距调整工程所关注的重要特征。 它对这些系统在电子设备中的适用性产生了深远的影响,其中间接带隙得到了量子产量效率。

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