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Molten‐Salt‐Assisted Chemical Vapor Deposition Process for Substitutional Doping of Monolayer MoS2 and Effectively Altering the Electronic Structure and Phononic Properties

机译:熔盐辅助化学气相沉积工艺用于单层MOS2的替代掺杂有效改变电子结构和声子特性

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摘要

Substitutional doping of layered transition metal dichalcogenides (TMDs) has been proved to be an effective route to alter their intrinsic properties and achieve tunable bandgap, electrical conductivity and magnetism, thus greatly broadening their applications. However, achieving valid substitutional doping of TMDs remains a great challenge to date. Herein, a distinctive molten‐salt‐assisted chemical vapor deposition (MACVD) method is developed to match the volatilization of the dopants perfectly with the growth process of monolayer MoS , realizing the substitutional doping of transition metal Fe, Co, and Mn. This doping strategy effectively alters the electronic structure and phononic properties of the pristine MoS . In addition, a temperature‐dependent Raman spectrum is employed to explore the effect of dopants on the lattice dynamics and first‐order temperature coefficient of monolayer MoS , and this doping effect is illustrated in depth combined with the theoretical calculation. This work provides an intriguing and powerful doping strategy for TMDs through employing molten salt in the CVD system, paving the way for exploring new properties of 2D TMDs and extending their applications into spintronics, catalytic chemistry and photoelectric devices.
机译:已经证明层状过渡金属二甲基甲基二甲硅烷(TMDS)的替代掺杂是改变其内在性质的有效途径,并达到可调谐带隙,导电性和磁性,从而大大拓宽了它们的应用。然而,迄今为止,实现TMDS的有效替代兴奋剂仍然是一个巨大的挑战。在此,开发了一种独特的熔盐辅助化学气相沉积(丙夫行)方法以与单层MOS的生长过程完全匹配掺杂剂的挥发,实现过渡金属Fe,Co和Mn的替代掺杂。这种掺杂策略有效地改变了原始MOS的电子结构和声子特性。此外,采用温度相关的拉曼光谱来探讨掺杂剂对单层MOS的晶格动力学和一阶温度系数的影响,并且这种掺杂效果深入地与理论计算结合。这项工作通过在CVD系统中使用熔融盐来提供一种有趣和强大的掺杂策略,用于挖盐,铺平了探索2D TMDS的新特性,并将其应用延伸到闪蒸,催化化学和光电装置中。

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