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首页> 外文期刊>Current Nanomaterials >Influence of Anisotropy on the Optical Refractive Index Change of Impurity Doped Quantum Dots in Presence of Gaussian White Noise
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Influence of Anisotropy on the Optical Refractive Index Change of Impurity Doped Quantum Dots in Presence of Gaussian White Noise

机译:高斯白噪声存在下各向异性对杂质掺杂量子点光学折射率变化的影响

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Background: Total optical refractive index (RI) change is an important nonlinear optical property (NLO). The NLO properties of quantum dot (QD) are strongly affected by the presence of impurity. In the present work we inspect profiles of total RI change of impurity doped QDs. Objective: We examine the influence of anisotropy on the total optical refractive index change (RI) of impurity doped quantum dots (QDs) in presence and absence of noise. Method: Noise has been applied to the system additively and multiplicatively. The impurity potential is modeled by a Gaussian function and the noise applied being Gaussian white noise. A perpendicular magnetic field emerges out as a confinement source and a static external electric field has been applied. The total RI change profiles have been pursued as a function of incident photon energy for different values of anisotropy. Results: The interplay between noise and anisotropy elegantly designs the total RI change profiles. The said interplay is modified as we switch from one mode of application of noise to another which eventually alters the total RI change profiles. Conclusion: The observations indicate the possibility of tailoring the total RI change profiles of doped QD systems exploiting noise and anisotropy.
机译:背景:总光学折射率(RI)的变化是重要的非线性光学特性(NLO)。杂质的存在强烈影响量子点(QD)的NLO性质。在目前的工作中,我们检查了杂质掺杂QD的总RI变化曲线。目的:我们研究了各向异性对存在和不存在噪声的杂质掺杂量子点(QD)的总光学折射率变化(RI)的影响。方法:噪声已相加和相乘地应用到系统。杂质电势由高斯函数建模,所施加的噪声为高斯白噪声。垂直磁场作为限制源出现,并且已经施加了静态外部电场。对于不同的各向异性值,总的RI变化曲线已作为入射光子能量的函数进行了追踪。结果:噪声和各向异性之间的相互作用设计了总的RI变化曲线。当我们从一种施加噪声的模式切换到另一种施加噪声的模式时,上述相互作用会被修改,这最终会改变总的RI变化曲线。结论:观察结果表明,利用噪声和各向异性来定制掺杂QD系统的总RI变化曲线的可能性。

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