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首页> 外文期刊>Synthetic Metals >Improved hydrogenated amorphous silicon thin-film solar cells realized by replacing n-type Si layer with PFN interfacial layer
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Improved hydrogenated amorphous silicon thin-film solar cells realized by replacing n-type Si layer with PFN interfacial layer

机译:通过用PFN界面层更换N型Si层来实现改进的氢化非晶硅薄膜太阳能电池

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摘要

Improvement in the device performance of hydrogenated amorphous silicon (a-Si:H) thin-film solar cells (TFSCs) without hazardous doping gases and complex processes has been a long-standing aim for many researchers. In this work, we replaced the n-type Si layer in an a-Si:H TFSC with an interfacial dipole layer of conjugated polymer electrolyte material, poly [(9,9-bis(3'-(N,N-dimethylamino) propyl)-2,7-fiuorene)-alt-2,7-(9,9-dioctylfluorene) (PFN), while keeping the conventional layer scheme. The addition of PFN eliminated the process complexity, improved the device performance, and generated a built-in potential (V-bi) across the p-type Si layer. The power conversion efficiency of the optimized device reached a maximum of 7.17%, which is significant when using a toxicant-free layer. The open-circuit voltage was improved to 0.80 V from 0.47 V in comparison to a reference a-Si:H TFSC without PFN, and the stability in light and dark conditions were greatly enhanced. The fill factor was increased from 0.45 to 0.59 because of the enhancement in shunt/series resistance. The improvement in device performance is mainly due to the creation of an interfacial dipole by the PFN layer, which generated the VIA across the p-type Si layer, decreased the potential barrier between the i-Si layer and aluminum cathode, and consequently reduced the defects resulting from the coating of the i-Si layer and enhanced electron extraction.
机译:改进氢化非晶硅(a-的Si:H)的器件性能的薄膜太阳能电池(薄膜太阳能电池)而没有有害的掺杂气体和复杂的过程一直是许多研究人员的长期目标。在这项工作中,我们用缀合的聚合物电解质材料的界面偶极层在A-Si:H TFSC中取代了N型Si层,聚(9,9-双(3' - (N,N-二甲基氨基)丙基)-2,7-氟烯)-2,7-(9,9-二辛基氟烯)(PFN),同时保持常规层方案。添加PFN消除了过程复杂性,改进了设备性能,并在P型Si层上产生了内置电位(V-BI)。优化器件的功率转换效率最高为7.17%,当使用无毒层时是显着的。与没有PFN的参考A-Si:H TFSC相比,开路电压从0.47V改善为0.80V,而没有PFN,并且大大提高了光和暗条件的稳定性。由于分流/串联电阻的增强,填充因子从0.45增加到0.59。装置性能的改善主要是由于通过在P型Si层上产生通孔的PFN层产生界面偶极子,降低了I-Si层和铝阴极之间的电位屏障,从而降低了由I-Si层涂层产生的缺陷和增强的电子提取。

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  • 来源
    《Synthetic Metals 》 |2017年第2017期| 共8页
  • 作者单位

    Korea Univ Coll Sci &

    Technol Sch Display &

    Semicond Phys Sejong Campus 2511 Sejong Ro Sejong City 339770 South Korea;

    Ulsan Natl Inst Sci &

    Technol Dept Energy Engn Ulsan 689798 South Korea;

    Korea Univ Coll Sci &

    Technol Sch Display &

    Semicond Phys Sejong Campus 2511 Sejong Ro Sejong City 339770 South Korea;

    Korea Inst Mat Sci Adv Funct Thin Films Dept Chang Won 641831 South Korea;

    Korea Univ Coll Sci &

    Technol Sch Display &

    Semicond Phys Sejong Campus 2511 Sejong Ro Sejong City 339770 South Korea;

    Korea Univ Coll Sci &

    Technol Sch Display &

    Semicond Phys Sejong Campus 2511 Sejong Ro Sejong City 339770 South Korea;

    Korea Inst Mat Sci Adv Funct Thin Films Dept Chang Won 641831 South Korea;

    Korea Inst Mat Sci Adv Funct Thin Films Dept Chang Won 641831 South Korea;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学 ;
  • 关键词

    A-Si:H thin-film solar cells; n-type dopant-free solar cells; PFN interfacial dipole layer;

    机译:A-Si:H薄膜太阳能电池;N型无掺杂的太阳能电池;PFN界面偶极层;

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