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Kinematic characteristic analysis of a micro-/nano positioning stage based on bridge-type amplifier

机译:基于桥型放大器的微/纳米定位阶段的运动特性分析

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摘要

The piezo-actuated micro-/nano positioning stage based on bridge-type amplifier is frequently designed and used in the current precision engineering applications. The displacement amplification ratio of displacement amplifier is vital for kinematic performance of a positioning stage. Based on the force analysis during the deformation process of bridge-type amplifier, an improved analytical model of the displacement amplification ratio is derived by employing the energy principle and the elastic beam theory to obtain a better prediction accuracy. After the comparisons with the existing analytical models and finite element analysis (FEA) results, the proposed model is proved has higher prediction accuracy than existing models, especially when the displacement amplification ratio changes with the interval of two adjacent flexure hinges. Based on proposed displacement amplification model for bridge-type amplifier, a kinematic model for a positioning stage is carried out by considering the structural stiffness of the positioning stage. Moreover, the two resistance factors are defined to calculate quantitatively the attenuated output displacement of piezoelectric actuator (PZA) and bridge-type amplifier in positioning systems. The correctness of the proposed theoretical model is verified by FEA and experiments, which indicates that the attenuation ratio of output displacement of the positioning stage up to a maximum of 58.76%. (C) 2018 Elsevier B.V. All rights reserved.
机译:基于桥式放大器的压电微/纳米定位阶段经常设计和使用在当前的精密工程应用中。位移放大器的位移放大比对于定位阶段的运动性能至关重要。基于桥式放大器变形过程的力分析,通过采用能量原理和弹性光束理论获得更好的预测精度来导出位移放大比的改进的分析模型。在与现有分析模型和有限元分析(FEA)结果的比较之后,证明了所提出的模型具有比现有模型更高的预测精度,尤其是当位移放大比随两个相邻弯曲铰链的间隔时变化。基于提出的桥型放大器的位移放大模型,通过考虑定位阶段的结构刚度来执行用于定位级的运动模型。此外,定义了两个电阻因子以定量地计算定量系统中压电致动器(PZA)和桥接型放大器的衰减输出位移。采用FEA和实验验证了所提出的理论模型的正确性,表明定位阶段的输出位移的衰减比率最高为58.76%。 (c)2018年elestvier b.v.保留所有权利。

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