首页> 外文期刊>Optik: Zeitschrift fur Licht- und Elektronenoptik: = Journal for Light-and Electronoptic >Fabrication of broadband antireflection coatings using wavelength-indirect broadband optical monitoring
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Fabrication of broadband antireflection coatings using wavelength-indirect broadband optical monitoring

机译:利用波长间接宽带光学监测制造宽带抗反射涂层

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摘要

Multi-layer optical coatings with complex spectrum requirements, such as multi-band pass filters, notch filters, ultra-broadband antireflection coating and etc., whose working wavelength is out of monitoring wavelength range, are difficult to be fabricated using direct broadband optical monitoring (BBOM). In this paper, a broadband antireflection (AR) coating in the wavelength range from 1300 nm to 2000 nm at 45 incident was designed and deposited by dual ion beam sputtering (DIBS). Ta2O5 and SiO2 were chosen as high and low refractive index coating materials, respectively. The optimized coating structure contains 4 non-quarter-wave (QW) layers. In order to obtain high transmittance, the most important is to realize the thickness accurate control. Due to the limitation of the monitoring wavelength range, which is only from 450 nm to 1000 nm, a wavelength-indirect broadband optical monitoring strategy was successfully employed to control the layers thickness during the deposition process. At last, a good agreement between theoretical and measured transmittance is obtained. The maximum error (the first layer) is only about 5.3% and the minimum error (the third layer) is about -0.25% base on the results of reverse engineering analysis. (C) 2017 Elsevier GmbH. All rights reserved.
机译:多层光学涂层具有复杂频谱要求,诸如多带通滤波器,陷波滤波器,超宽带抗反射涂层等,其工作波长为监测波长范围内时,难以直接使用宽带光学监测来制造(生产数据)。在本文中,一个宽带防反射(AR)在45入射的波长范围内涂层从1300纳米至2000纳米的设计,并通过双离子束溅射(DIBS)沉积。 Ta2O5和SiO2分别选择为高和低折射率的涂层材料。优化涂覆结构包含4个非四分之一波(QW)层。为了获得高透射率,最重要的是实现厚度精确控制。由于监测波长范围内,这是只能从450纳米到1000纳米的限制,波长间接宽带光监视策略被成功地用于控制在沉积过程中的各层的厚度。最后,得到的理论和实测透光率之间有很好的一致性。的最大误差(第一层)仅约为5.3%,最小误差(第三层)是关于逆向工程分析的结果-0.25%的基础。 (c)2017年Elsevier GmbH。版权所有。

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