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Fabrication of broadband antireflection coatings using broadband optical monitoring mixed with time monitoring

机译:使用宽带光学监控和时间监控来制造宽带减反射涂层

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摘要

Multi-layer optical coatings with complex spectrum requirements,such as multi-band pass filters,notch filters,and ultra-broadband antireflection coating,which usually contain very thin layers and sensitive layers,are difficult to be fabricated using a quartz crystal monitoring method or a single wavelength optical monitoring system (SWLOMS).In this paper,a broadband antireflection (AR) coating applied in the wavelength range from 800 nm to 1800 nm was designed and deposited by ion beam sputtering (IBS).Ta2O5 and SiO2 were chosen as high and low refractive index coating materials,respectively.The optimized coating structure contains 9 non-quarter-wave (QW) layers totally with ultra-thin layers and sensitive layers in this coating stack.In order to obtain high transmittance,it is very important to realize the thickness accurate control on these thin layers and sensitive layers.A broadband optical monitoring mixed with time monitoring strategy was successfully used to control the layer thickness during the deposition process.At last,the measured transmittance of AR coating is quite close to the theoretical value.A 0.6% variation in short wavelength edge across the central 180 mm diameter is demonstrated.A spectrum shift of less than 0.5% for 2 continuous runs is also presented.
机译:具有复杂光谱要求的多层光学涂层,例如多带通滤光片,陷波滤光片和超宽带抗反射涂层,通常包含非常薄的层和敏感层,很难用石英晶体监测方法或本文设计了一种宽带抗反射涂层,该涂层在800 nm至1800 nm波长范围内应用离子束溅射(IBS)沉积,选择Ta2O5和SiO2作为涂层。优化的涂层结构包含9个非四分之一波长(QW)层,在该涂层堆栈中总共包含超薄层和敏感层。为了获得高透射率,这非常重要实现了对这些薄层和敏感层厚度的精确控制。成功地将宽带光学监测与时间监测策略相结合来控制层厚度。最后,测得的增透膜的透射率与理论值相当接近。证明了中心180 mm直径的短波长边缘有0.6%的变化。2的光谱位移小于0.5%还介绍了连续运行。

著录项

  • 来源
    《中国物理:英文版》 |2017年第5期|382-385|共4页
  • 作者单位

    Key Laboratory of Chemical Lasers, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian 116023, China;

    School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China;

    Key Laboratory of Chemical Lasers, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian 116023, China;

    Key Laboratory of Chemical Lasers, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian 116023, China;

    Key Laboratory of Chemical Lasers, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian 116023, China;

    Key Laboratory of Chemical Lasers, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian 116023, China;

  • 收录信息 中国科学引文数据库(CSCD);中国科技论文与引文数据库(CSTPCD);
  • 原文格式 PDF
  • 正文语种 eng
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