Investigation the phase transformation of sputtered molybdenum oxide thin films and their correlation with the film thickness

摘要

AbstractPolycrystalline of as-deposited molybdenum oxide thin films were synthesized using Radio-Frequency sputtering technique. X-ray diffraction technique showed the formation of hexagonal MoO3beside the β-MoO3phase for thin films of thickness 39nm. The higher film thickness at about 132nm showed the new tetragonal phase of molybdenum oxide MoO2beside the β- phase. The film morphology and roughness were observed by Atomic Force Microscopy which approved that the roughness was observed to decrease as the film thickness increase. Optical properties of the sputtered films were examined by UV-visible spectral measurements. The optical band gap values are varied from 3.74eV for lower film thickness to 3.8eV for higher film thickness. Photoluminescence spectra were recorded for the studied films showing the spectral broadness in the range 350–600nm related to near band edge emission and a red emission is observed at 725nm.]]>