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Localized Heating and Switching in MoTe2-Based Resistive Memory Devices

机译:基于Mote2的电阻存储器件中的本地化加热和切换

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Two-dimensional (2D) materials have recently been incorporated into resistive memory devices because of their atomically thin nature, but their switching mechanism is not yet well understood. Here we study bipolar switching in MoTe2-based resistive memory of varying thickness and electrode area. Using scanning thermal microscopy (SThM), we map the surface temperature of the devices under bias, revealing clear evidence of localized heating at conductive "plugs" formed during switching. The SThM measurements are correlated to electro-thermal simulations, yielding a range of plug diameters (250 to 350 nm) and temperatures at constant bias and during switching. Transmission electron microscopy images reveal these plugs result from atomic migration between electrodes, which is a thermally-activated process. However, the initial forming may be caused by defect generation or Te migration within the MoTe2. This study provides the first thermal and localized switching insights into the operation of such resistive memory and demonstrates a thermal microscopy technique that can be applied to a wide variety of traditional and emerging memory devices.
机译:最近,二维(2D)材料已被纳入电阻存储器装置,因为它们的原子薄的性质,但它们的开关机构尚未理解。在这里,我们研究了不同厚度和电极区域的基于Mote2的电阻存储器的双极切换。使用扫描热显微镜(STHM),我们在偏压下映射器件的表面温度,揭示在切换期间形成的导电“插头”下局部加热的清晰证据。 STHM测量与电热模拟相关,产生一系列塞直径(250至350nm)和恒定偏置的温度和切换。透射电子显微镜图像显示这些插头是由电极之间的原子迁移产生的,这是一个热激活的过程。然而,初始形成可能是由MOTE2内的缺陷产生或迁移引起的。本研究提供了第一种热和局部切换洞察这种电阻存储器的操作,并演示了一种可应用于各种传统和新兴的存储器件的热显微镜技术。

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