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首页> 外文期刊>Nature reviews Cancer >Direct observation of the hysteretic Fermi level modulation in monolayer MoS2 field effect transistors
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Direct observation of the hysteretic Fermi level modulation in monolayer MoS2 field effect transistors

机译:直接观察Monolayer MOS2场效应晶体管中的滞质费液位调制

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摘要

The hysteresis in the transfer curve of MoS2 has significant impact on the device performance. However, the hysteresis mechanism is still not clear. Here, we investigate the hysteresis of the monolayer MoS2 by probing the local Fermi level variations as a function of the back gate voltage in different atmosphere using the Kelvin probe microscopy. While the Fermi level of the MoS2 in air is much lower than that in vacuum, both the MoS2 devices in vacuum and air show large Fermi level hysteresis. The Fermi level hysteresis direction is clock-wise, identical to that observed in the transfer curves. Both the hysteresis in Fermi level and transfer curve can be explained consistently by taking into account the charge trapping. Our findings confirm that carrier density modulation in MoS2 plays a vital role in the hysteresis, and provide insight into the hysteresis mechanism for the optimization of the device performance.
机译:MOS2的传递曲线中的滞后对器件性能产生显着影响。 然而,滞后机制仍然不明确。 这里,我们通过使用kelvin探针显微镜探测不同气氛中的后栅极电压的函数来研究单层MOS2的滞后。 虽然空气中MOS2的FERMI水平远低于真空中的MOS2,但是真空和空气中的MOS2器件都显示出大的费米水平滞后。 费米水平滞后方向是时钟明智的,与在转移曲线中观察到的相同。 通过考虑到电荷捕获,可以一致地解释费米水平和转移曲线中的滞后。 我们的研究结果证实,MOS2中的载流子密度调制在滞后中起着至关重要的作用,并对滞后机制提供了优化器件性能的洞察力。

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