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In situ passivation of GaAsP nanowires

机译:原位钝化GaASP纳米线

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摘要

We report on the structural and optical properties of GaAsP nanowires (NWs) grown by molecularbeamepitaxy. By adjusting the alloy composition in theNWs, the transition energy was tuned to the optimal value required for tandem III-V/silicon solar cells. We discovered that an unintentional shell was also formed during the GaAsP NW growth. The NW surface was passivated by an in situ deposition of a radial Ga(As) P shell. Different shell compositions and thicknesses were investigated. We demonstrate that the optimal passivation conditions for GaAsP NWs (with a gap of 1.78 eV) are obtained with a 5 nm thick GaP shell. This passivation enhances the luminescence intensity of the NWs by 2 orders of magnitude and yields a longer luminescence decay. The luminescence dynamics changes from single exponential decay with a 4 ps characteristic time in non-passivated NWs to a biexponential decay with characteristic times of 85 and 540 ps in NWs with GaP shell passivation.
机译:我们报告了分子泡沫生长的GaASP纳米线(NWS)的结构和光学性质。 通过调节Thews中的合金组合物,将过渡能量调整为串联III-V /硅太阳能电池所需的最佳值。 我们发现在GaASP NW生长期间也形成了无意的壳。 通过径向Ga(AS)p壳体的原位沉积钝化NW表面。 研究了不同的壳组合物和厚度。 我们证明,用5nm厚的间隙壳获得GaASP NWS(具有1.78eV)的最佳钝化条件。 这种钝化通过2个数量级增强了NW的发光强度,并产生更长的发光衰减。 发光动力学从单指数衰减发生在非钝化的NW中的4 PS特性时间与具有间隙外壳钝化的NWS中的具有85和540ps的特征时间的Biexponential衰减。

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  • 来源
    《Nanotechnology》 |2017年第49期|共11页
  • 作者单位

    Univ Paris Saclay Univ Paris Sud CNRS UMR 9001 Ctr Nanosci &

    Nanotechnol Site Orsay Bat 220 Rue Andre Ampere F-91405 Orsay France;

    Univ Paris Saclay Univ Paris Sud CNRS UMR 9001 Ctr Nanosci &

    Nanotechnol Site Marcous Route Nozay F-91460 Marcoussis France;

    Univ Paris Saclay Univ Paris Sud CNRS UMR 9001 Ctr Nanosci &

    Nanotechnol Site Marcous Route Nozay F-91460 Marcoussis France;

    Univ Lyon INL CNRS UMR 5270 INSA Lyon 7 Ave Jean Capelle F-69621 Villeurbanne France;

    Univ Paris Saclay Univ Paris Sud CNRS UMR 9001 Ctr Nanosci &

    Nanotechnol Site Marcous Route Nozay F-91460 Marcoussis France;

    Univ Paris Saclay Univ Paris Sud CNRS UMR 9001 Ctr Nanosci &

    Nanotechnol Site Marcous Route Nozay F-91460 Marcoussis France;

    Univ Paris Saclay Univ Paris Sud CNRS UMR 9001 Ctr Nanosci &

    Nanotechnol Site Orsay Bat 220 Rue Andre Ampere F-91405 Orsay France;

    Univ Paris Saclay Univ Paris Sud CNRS UMR 9001 Ctr Nanosci &

    Nanotechnol Site Marcous Route Nozay F-91460 Marcoussis France;

    Univ Paris Saclay Univ Paris Sud CNRS UMR 9001 Ctr Nanosci &

    Nanotechnol Site Marcous Route Nozay F-91460 Marcoussis France;

    Univ Paris Saclay Univ Paris Sud CNRS UMR 9001 Ctr Nanosci &

    Nanotechnol Site Orsay Bat 220 Rue Andre Ampere F-91405 Orsay France;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 特种结构材料;
  • 关键词

    nanowire; molecular beam epitaxy (MBE); photoluminescence; GaAsP/Ga(As)P; in situ passivation;

    机译:纳米线;分子束外延(MBE);光致发光;GAASP / GA(AS)P;原位钝化;

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