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A Study on the Effect of Electrodeposition Parameters on the Morphology of Porous Nickel Electrodeposits

机译:电沉积参数对多孔镍电沉积物形态的影响研究

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摘要

In this study, the electrodeposition of nickel foam by dynamic hydrogen bubble-template method is optimized, and the effects of key deposition parameters (applied voltage and deposition time) and bath composition (concentration of Ni2+, pH of the bath, and roles of Cl- and SO4 (2-) ions) on pore size, distribution, and morphology and crystal structure are studied. Nickel deposit from 0.1 M NiCl2 bath concentration is able to produce the honeycomb-like structure with regular-sized holes. Honeycomb-like structure with cauliflower morphology is deposited at higher applied voltages of 7, 8, and 9 V; and a critical time ( 3 minutes) is required for the development of the foamy structure. Compressive residual stresses are developed in the porous electrodeposits after 30 seconds of deposition time (-189.0 MPa), and the nature of the residual stress remains compressive upto 10 minutes of deposition time (-1098.6 MPa). Effect of pH is more pronounced in a chloride bath compared with a sulfate bath. The increasing nature of pore size in nickel electrodeposits plated from a chloride bath (varying from 21 to 48 mu m), and the constant pore size (in the range of 22 to 24 mu m) in deposits plated from a sulfate bath, can be ascribed to the striking difference in the magnitude of the corresponding current-time profiles.
机译:在该研究中,优化了通过动态氢气泡模板方法的镍泡沫的电沉积,以及关键沉积参数(施加的电压和沉积时间)和浴组合物(Ni2 +,浴的pH的浓度,以及Cl的角色的影响研究了孔径,分布和形态和晶体结构的SO4(2-)离子。 0.1M NiCl2浴浓度的镍沉积物能够产生常规孔的蜂窝状结构。具有花椰菜形态的蜂窝状结构在7,8和9 V的较高施加电压下沉积;泡沫结构的开发需要临界时间(& 3分钟)。在30秒的沉积时间(-189.0MPa)后,在多孔电介质中在多孔电介质中开发压缩残余应力,并且残留应力的性质保持压缩高达10分钟的沉积时间(-1098.6MPa)。与硫酸盐浴相比,pH的影响在氯化物浴中更明显。从氯化物浴(改变21至48μm)的镍电沉积物中孔径的增加性质,以及从硫酸盐浴的沉积物中恒定的孔径(在22-240至24μm)中,可以归因于相应的电流概况的幅度突出差异。

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