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Chemical-Assisted Mechanical Lapping of Thin Boron-Doped Diamond Films: A Fast Route Toward High Electrochemical Performance for Sensing Devices

机译:薄硼掺杂金刚石薄膜的化学辅助机械研磨:对传感装置的高电化学性能的快速路径

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摘要

There is an urgent need for an effective and economically viable increase in electrochemical performance of boron-doped diamond (BDD) electrodes that are used in sensing and electrocatalytic applications. Specifically, one must take into consideration the electrode heterogeneity due to nonhomogenous boron-dopant distribution and the removal of sp(2) carbon impurities saturating the electrode, without interference in material integrity. In this work, authors describe a detailed study on electrochemical performance and the enhancement of electrochemical active surface area in the BDD electrodes that have been pretreated via chemical-assisted mechanical lapping.
机译:迫切需要在感测和电催化应用中使用的硼掺杂金刚石(BDD)电极的电化学性能的有效和经济上可行的增加。 具体地,必须考虑由于非源于硼掺杂剂分布引起的电极异质性,并除去饱和电极的SP(2)碳杂质,而不会干扰材料完整性。 在这项工作中,作者描述了通过化学辅助机械研磨预处理的BDD电极中的电化学性能和增强电化学性能的详细研究。

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