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首页> 外文期刊>Journal of Physics. Condensed Matter >Electronic structure of the 1D conductor K0.3MoO3 studied using resonant inelastic X-ray scattering and soft X-ray emission spectroscopy
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Electronic structure of the 1D conductor K0.3MoO3 studied using resonant inelastic X-ray scattering and soft X-ray emission spectroscopy

机译:使用共振非弹性X射线散射和软X射线发射光谱研究一维导体K0.3MoO3的电子结构

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摘要

The electronic structure of the quasi-one-dimensional conductor K0.3MoO3 has been measured using high resolution resonant inelastic x-ray scattering and x-ray absorption spectroscopy. The results are compared to those for the related two-dimensional insulator alpha-MoO3. Features of the scattering from both oxides are observed and are explained in terms of the band momentum selectivity of the scattering process, allowing a comparison of the scattering data with recent band structure calculations.
机译:准一维导体K0.3MoO3的电子结构已使用高分辨率共振非弹性X射线散射和X射线吸收光谱法进行了测量。将结果与相关二维绝缘子alpha-MoO3的结果进行比较。观察到了两种氧化物的散射特征,并根据散射过程的带动量选择性进行了解释,从而可以将散射数据与最新的带结构计算进行比较。

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