首页> 外文期刊>Journal of Physics. Condensed Matter >Point-contact Andreev-reflection spectroscopy in segregation-free Mg1-xAlxB2 single crystals up to x=0.32
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Point-contact Andreev-reflection spectroscopy in segregation-free Mg1-xAlxB2 single crystals up to x=0.32

机译:无偏析Mg1-xAlxB2单晶中x = 0.32的点接触安德列夫反射光谱

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摘要

We present new results of point-contact Andreev-reflection ( PCAR) spectroscopy in single-phase Mg1-xAlxB2 single crystals with x up to 0.32. Fitting the conductance curves of our point contacts with the two-band Blonder-Tinkham-Klapwijk model allowed us to extract the gap amplitudes Delta(sigma) and Delta(pi). The gap values agree rather well with other PCAR results for Al-doped crystals and polycrystals up to x=0.2 reported in the literature, and extend them to higher Al contents. In the low-doping regime, however, we observed an increase in the small gap Delta(pi) on increasing x (or decreasing the local critical temperature of the junctions, T-c(A)) which is not as clearly found for other samples. On further decreasing T-c(A) below 30 K, both the gaps decrease and, up to the highest doping level x = 0.32 and down to T-c(A) = 12 K, no gap merging is observed. A detailed analysis of the data within the two-band Eliashberg theory shows that this gap trend can be explained as being mainly due to the band filling and to an increase in the interband scattering which is necessary to account for the increase in Delta(pi) at low Al contents ( x < 0.1). We suggest interpreting the following decrease of Delta(pi) for T-c(A) < 30 K as being governed by the onset of the inhomogeneity and disorder in the Al distribution that partly mask the intrinsic effects of doping and are not taken into account in standard theoretical approaches.
机译:我们提出点接触安德列夫反射(PCAR)光谱在x高达0.32的单相Mg1-xAlxB2单晶体中的新结果。用两波段的Blonder-Tinkham-Klapwijk模型拟合点接触的电导曲线,可以提取间隙幅度Delta(sigma)和Delta(pi)。间隙值与文献中报道的最高x = 0.2的Al掺杂晶体和多晶体的其他PCAR结果非常吻合,并将其扩展到更高的Al含量。然而,在低掺杂状态下,我们观察到随着x的增加(或结的局部临界温度T-c(A)的降低),小间隙Delta(pi)的增加,这在其他样品中并未发现。随着T-c(A)进一步降低到30 K以下,两个缝隙都减小,直到最高掺杂水平x = 0.32和T-c(A)= 12 K,都没有观察到缝隙合并。对两频带Eliashberg理论中数据的详细分析表明,这种间隙趋势可以解释为主要是由于频带填充和频带间散射的增加所致,这是解决Delta(pi)的增加所必需的在低铝含量下(x <0.1)。我们建议将以下Tc(A)<30 K的Delta(pi)的降低解释为受Al分布不均匀和无序现象的影响,该现象部分掩盖了掺杂的内在作用,在标准中未考虑在内理论方法。

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