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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Kinetic Monte Carlo simulation of quantum dot growth on stepped substrates
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Kinetic Monte Carlo simulation of quantum dot growth on stepped substrates

机译:阶梯状衬底上量子点生长的动力学蒙特卡洛模拟

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The growth of quantum dots (QDs) on various Si platforms often results in a bimodal distribution for the size of the QD. This has been previously attributed to the use of vicinal substrates. In this study, a kinetic Monte Carlo (KMC) simulation using a double-zone model is used to study the formation of QDs on the stepped substrate. In this double-zone model, the substrate is divided into two regions, the step region and the terrace region. An additional activation barrier of E_(step) is introduced for adatoms diffusing in the step region. Preferential nucleation at the step region was observed and the dot size distribution uniformity depends on the growth temperature and the magnitude of Estep.
机译:各种Si平台上量子点(QD)的增长通常会导致QD尺寸的双峰分布。先前已将其归因于邻近基底的使用。在这项研究中,使用双区域模型的动力学蒙特卡洛(KMC)模拟用于研究阶梯状衬底上QD的形成。在此双区域模型中,基板分为两个区域,即阶梯区域和平台区域。引入了E_(step)的附加激活势垒,用于在台阶区域扩散的吸附原子。在台阶区域观察到优先成核,并且点尺寸分布均匀性取决于生长温度和Estep的大小。

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