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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Assisted electrochemical etching of photonic luminescent multilayers of porous silicon
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Assisted electrochemical etching of photonic luminescent multilayers of porous silicon

机译:多孔硅光子发光多层膜的辅助电化学刻蚀

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Porous silicon is produced by electrochemical etching of crystalline silicon substrates in an electrolyte usually composed of aqueous HF and ethanol. Under this condition, photonic multilayers can be built with highly p-type-doped (p~+) substrates, or luminescent layers can be produced with lightly p-type-doped (p~-) substrates. The task of building structures with both features has not been successfully achieved. In this paper, it is shown that assisted electrochemical etching of p~+ substrates with polyoxometalate and H_2O_2 can produce multilayers with both features: luminescence in the visible region and optical quality for photonic applications.
机译:多孔硅是通过在通常由HF和乙醇水溶液组成的电解质中对晶体硅基板进行电化学蚀刻而制成的。在这种条件下,可以使用高度掺杂p型(p〜+)的衬底来构建光子多层,或者可以使用轻微掺杂p型(p〜-)的衬底来制造发光层。具有两个功能的结构的任务尚未成功完成。本文表明,用多金属氧酸盐和H_2O_2辅助p〜+衬底的电化学刻蚀可以产生具有以下两个特征的多层:可见光区域的发光和光子应用的光学质量。

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