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Growth mechanism of one dimensional tin nanostructures by electrodeposition

机译:电沉积一维锡纳米结构的生长机理

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摘要

One-dimensional tin nanostructures are synthesized using a template-free facile electrodeposition process without the use of electrolyte additives or surfactants. The needles have an elongated pyramidal shape with a rhomboidal base, and exhibit quasi-dendritic morphologies. The growth of these nanostructures, termed "nanoneedles," is substrate independent due to the formation of a tin film on the substrate surface prior to nucleation. Tin protrusions form preferentially as localized regions on the surface experience increased mass transport due to the transition from 2D linear to 3D spherical diffusion. Early in the growth, Joule heating melts the protrusion tip, and then spherical diffusion to the liquid tip drives the formation of the needles via self-catalyzed growth. This initial part of the process depends on a critical Nernst diffusion layer thickness (mass transport rate) and is controlled by the variation of solution agitation, tin concentration, temperature, and cathodic current density. Subsequently, deposition is rate limited by the kinetics of tin reduction.
机译:一维锡纳米结构是使用无模板的便捷电沉积工艺合成的,无需使用电解质添加剂或表面活性剂。针具有带有菱形基部的细长的金字塔形状,并表现出准树突形态。这些成核的纳米结构的生长是与基底无关的,这是由于在成核之前在基底表面上形成了锡膜。由于从2D线性扩散到3D球形扩散的过渡,表面上的局部区域经历了更高的质量传输,因此锡突起优先形成。在生长的早期,焦耳加热会熔化突出尖端,然后向液体尖端的球形扩散会通过自催化生长驱动针的形成。该过程的最初部分取决于临界能斯特扩散层的厚度(质量传输速率),并受溶液搅拌,锡浓度,温度和阴极电流密度的变化控制。随后,沉积受到锡还原动力学的限制。

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