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Effects of deposition temperature and CdCl2 annealing on the CdS thin films prepared by pulsed laser deposition

机译:沉积温度和CdCl2退火对脉冲激光沉积CdS薄膜的影响

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Pulsed laser deposition (PLD) technique is suitable for the deposition of high-quality compound semiconductor thin films, and has been widely developed in recent years. However, pulsed laser deposition of CdS films has rarely been reported. In this work, we prepared CdS thin films using PLD. The effects of growth temperature on the PLD-CdS thin films were studied towards high-performance CdS/CdTe thin film solar cells. Results showed that the CdS film prepared at 400 degrees C has the best crystallinity and optical transmittance, while 200 degrees C is more suitable for the window layer of CdTe solar cells due to the highest energy conversion efficiency and the best short-wavelength response. CdCl2 annealing treatment was also employed on the 200 degrees C-deposited and 400 degrees C-deposited PLD-CdS layer. Annealing treatment further enhanced crystallinity, and obviously enlarged the grain size. Optical transmittance spectra showed that the band gap of the CdS films increased after annealing. Fermi level of CdS films shifted closer to the conduction band from XPS analysis. CdTe solar cells with annealed windows obtained further improved performance, including higher short-circuit current, open-circuit voltage and energy conversion efficiency. (C) 2015 Elsevier B.V. All rights reserved.
机译:脉冲激光沉积(PLD)技术适用于高质量化合物半导体薄膜的沉积,并且近年来已得到广泛发展。但是,很少有关于CdS薄膜的脉冲激光沉积的报道。在这项工作中,我们使用PLD制备了CdS薄膜。针对高性能CdS / CdTe薄膜太阳能电池,研究了生长温度对PLD-CdS薄膜的影响。结果表明,在400摄氏度下制备的CdS薄膜具有最佳的结晶度和透光率,而200摄氏度由于具有最高的能量转换效率和最佳的短波长响应而更适合CdTe太阳能电池的窗口层。在200摄氏度和400摄氏度的PLD-CdS层上也进行了CdCl2退火处理。退火处理进一步增强了结晶度,并明显增大了晶粒尺寸。透光光谱表明,退火后CdS薄膜的带隙增加。根据XPS分析,CdS膜的费米能级更接近导带。具有退火窗口的CdTe太阳能电池获得了进一步改善的性能,包括更高的短路电流,开路电压和能量转换效率。 (C)2015 Elsevier B.V.保留所有权利。

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