首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Temperature and tellurium (Te) dependence of electrical characterization and surface properties for a chalcopyrite structured schottky barrier diode
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Temperature and tellurium (Te) dependence of electrical characterization and surface properties for a chalcopyrite structured schottky barrier diode

机译:黄铜矿结构肖特基势垒二极管的电特性和表面性质对温度和碲(Te)的依赖性

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摘要

Al/p-CuIn_(0.7)Ga_(0.3)(Se_(1-x)Te_x)_2/Mo Schottky barrier diodes (SBD) have been investigated as electrical and morphological. Electrical characterization and surface maps of the prepared CuIn_(0.7)Ga_(0.3)(Se_(1-x)Te_x)_2 (briefly, CIGSeTe) compounds with two different compositions for x = 0.0 and 0.6 were examined in 150-300 K range. CIGSeTe films were grown on Mo back contact. Some electrical parameters such as, ide ality factors, n; zero-bias barrier heights, ф_(bo) and Richardson constants were calculated from the current-voltage (I-V) measurements and plotted as a function of temperature. These results verify that electrical properties of these two diodes can be defined on the basis of the Thermionic emission (TE) theory with the Gaussian distribution (GD) of the Schottky barrier height (SBH) being related to inhomogeneities at the metal/semiconductor (MS) interface. On the other hand, we saw a better morphology in Te rich sam ples. Rms (root mean square) values increased from 8.50 nm to 9.80 nm with higher pellets on surface with Te.
机译:已经研究了Al / p-CuIn_(0.7)Ga_(0.3)(Se_(1-x)Te_x)_2 / Mo肖特基势垒二极管(SBD)的电学和形貌。在150-300 K的范围内检查了制备的CuIn_(0.7)Ga_(0.3)(Se_(1-x)Te_x)_2(简写为CIGSeTe)化合物的电特性和表面图,该化合物具有两种不同的x = 0.0和0.6 。 CIGSeTe薄膜在Mo背接触上生长。一些电气参数,例如理想因子n;从电流-电压(I-V)测量值计算出零偏置势垒高度ф_(bo)和Richardson常数,并将其绘制为温度的函数。这些结果证明,可以根据热电子发射(TE)理论定义这两个二极管的电性能,其中肖特基势垒高度(SBH)的高斯分布(GD)与金属/半导体(MS)的不均匀性有关)界面。另一方面,我们在富Te样品中看到了更好的形态。 Rms(均方根)值从8.50 nm增加到9.80 nm,Te表面的团粒数量更多。

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