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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >A promising sputtering for in situ fabrication of CIGS thin films without post-selenization
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A promising sputtering for in situ fabrication of CIGS thin films without post-selenization

机译:一种无需后硒化就可原位制造CIGS薄膜的有前途的溅射方法

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摘要

A promising route based on in situ radio frequency sputtering a quaternary CIGS target without post-selenization treatment can be achieved. The deposited CIGS films shows clear CIGS chalcopyrite structure, highly (112) oriented and dense polycrystalline grains. The proposed Cu precursor film, an induced layer, can be better for CIGS formation with controllable composition. Devices built with these films exhibit efficiencies of 1.25%. Higher efficient can be expected for CIGS solar cells by further improving this low-cost, simple and large-scale technique.
机译:可以实现一种基于原位射频溅射,无需后硒化处理的四级CIGS靶标的有前途的途径。沉积的CIGS薄膜显示出清晰的CIGS黄铜矿结构,高度(112)取向和致密的多晶晶粒。拟议的铜前驱体膜(诱导层)可以更好地用于具有可控成分的CIGS形成。用这些薄膜制成的设备的效率为1.25%。通过进一步改进这种低成本,简单和大规模的技术,可以期望CIGS太阳能电池具有更高的效率。

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