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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Influence of potential, deposition time and annealing temperature on photoelectrochemical properties of electrodeposited iron oxide thin films
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Influence of potential, deposition time and annealing temperature on photoelectrochemical properties of electrodeposited iron oxide thin films

机译:电势,沉积时间和退火温度对电沉积氧化铁薄膜光电化学性能的影响

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摘要

Nanostructured iron oxide thin films have been prepared by electrodeposition technique and annealed at various temperatures. The effect of deposition potential, deposition time and annealing temperature on photoelectrochemical (PEC) properties of α-Fe_2O_3 thin films was studied. The (104) and (11 0) peak presence in X-ray diffraction patterns confirms α-Fe_2O_3 phase formation. The transition on surface morphology from nanosheets to elongated dumbbell shaped nanoparticles occurred that can be attributed to annealing temperature varied from 400 to 700 °C. Optical band gap variation was observed due to annealing temperature. It was found that increment in film thickness increases the photocurrent from 253 μA/cm~2 to 488 μA/cm~2 at 0.4 V vs Ag/AgCl.
机译:纳米结构的氧化铁薄膜已经通过电沉积技术制备并在各种温度下退火。研究了沉积电势,沉积时间和退火温度对α-Fe_2O_3薄膜光电化学性能的影响。 X射线衍射图中出现的(104)和(11 0)峰证实了α-Fe_2O_3相的形成。发生了从纳米片到细长的哑铃形纳米颗粒的表面形态转变,这可以归因于退火温度在400至700°C之间变化。由于退火温度,观察到光学带隙变化。已经发现,相对于Ag / AgCl,在0.4V下,膜厚度的增加使光电流从253μA/ cm〜2增加到488μA/ cm〜2。

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