首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Properties of Ni doped and Ni-Ga co-doped ZnO thin films prepared by pulsed laser deposition
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Properties of Ni doped and Ni-Ga co-doped ZnO thin films prepared by pulsed laser deposition

机译:脉冲激光沉积制备Ni掺杂Ni-Ga共掺杂ZnO薄膜的性能

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摘要

ZnNiO and Zn(Ni,Ga)0 thin films were prepared on glass substrates by pulsed laser deposition. The obtained films are of good crystal quality and have smooth surfaces, which have a hexagonal wurtzite ZnO structure with a highly c-axis orientation without any Ga or Ni related phases. Hall-effect measurements showed that the ZnNiO film is n-type, in which the carrier concentration would be greatly enhanced by the addition of Ga. Room temperature ferromagnetism is observed for the ZnNiO and Zn(Ni,Ga)0 films. The addition of Ga into the ZnNiO films increases the electron concentration but weakens the room temperature ferromagnetism.
机译:通过脉冲激光沉积在玻璃基板上制备了ZnNiO和Zn(Ni,Ga)0薄膜。所获得的膜具有良好的晶体质量并且具有光滑的表面,该表面具有六方纤锌矿型ZnO结构,具有高度c轴取向,没有任何Ga或Ni相关相。霍尔效应测量表明,ZnNiO薄膜为n型,其中添加Ga将大大提高载流子浓度。ZnNiO和Zn(Ni,Ga)0薄膜观察到室温铁磁。将Ga添加到ZnNiO薄膜中会增加电子浓度,但会弱化室温铁磁性。

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