Effect of NH_3 on the preparation of TiN_x ilms by laser CVD using tetrakis-diethylamido-titanium

摘要

Titanium nitride (TiN_x) films were prepared by laser chemical vapor deposition (LCVD) with tetrakis-diethylamido-titanium (TDEAT) and NH_3 as the source materials. The effects of the fraction of ammonia (F_(NH_3) ) on the microstructure, preferred orientation and deposition rate were investigated. Non-oriented TiN_x films with a cauliflower-like texture were obtained without NH3, whereas (111), (2 0 0) and (2 2 0) preferred TiN_x films in a single phase with facetted and square textures were obtained with NH_3 gas. The lattice parameter decreased slightly with increasing F_(NH_3). The deposition rate (R_(dep)) of TiN_x films with a deposition area of about 300 mm~2 increased with increasing F_(NH_3), and attained the highest value of 90 mu m h~(-1) at F_(dep) =0.5, laser power (P_L) = 100 Wand deposition temperature (T_(dep) = 597 deg C.