New Freezing Material Unveiled for 22-nm Node Semiconductors

摘要

JSR Corp. has created an innovative lithographic material that opens the door to the formation of semiconductor circuits in the 22-nanometer technology node, which is the next milestone for semiconductor fabrication following the 32-nanometer node with half-pitch of 32 nanometers. The Tokyo-based company reported that it had achieved 32-nanometer line and space patterns for 22-nanometer node semiconductor devices by using a new "freezing material" for double patterning. According to JSR, double patterning, such as double exposure/double etch or double exposure/single etch, are promising methods for processes at the 22-nanometer technology node.