首页> 外文期刊>Surface & Coatings Technology >Phase formation and microstructure evolution of reactively r.f. magnetron sputtered Cr-Zr oxynitride thin films
【24h】

Phase formation and microstructure evolution of reactively r.f. magnetron sputtered Cr-Zr oxynitride thin films

机译:反应射频的相形成和微观结构演变磁控溅射Cr-Zr氧氮化物薄膜

获取原文
获取原文并翻译 | 示例
           

摘要

Thin films in the system Cr-Zr-O-N were deposited by reactive r.f. magnetron sputtering at a substrate temperature of 500 °C in various argon-oxygen-nitrogen plasmas. The depositions were realized by an experimental combinatorial approach: five substrates were placed linearly in front of a circular segmented target consisting of a metallic Cr and Zr half plate. Consequently, the coated samples exhibit different elemental compositions (with respect to their position in relation to the target half plates, i.e. from Cr-rich to Zr-rich) and constitutions. Additionally to the impact of the Cr/Zr concentration ratio (mainly determined by the sample position in relation to the target) the influence of reactive gases, i.e. oxygen and nitrogen, on phase formation, microstructure evolution, hardness and Young'smoduluswas investigated. For this purpose, the O_2 and N_2 gas flowswere varied systematically,while the total gas pressurewas kept constant for all depositions. The coatingswere characterized by electron probe micro analysis (EPMA), X-ray diffraction (XRD) and microindentation. In dependence of the sample position and the reactive gas flow ratio coatings with various phases were grown: i) coatings with a high Cr/(Cr + Zr) concentration ratio (i.e. grown at the Cr-rich side of the target) exhibited a single-phase solid solution corundum structure with up to 1.9 at.% nitrogen incorporation, (Cr,Zr)_2(O,N)_3. ii) coatings with similar Cr and Zr concentration (i.e. grown at the center positions of the target) exhibited a single-phase solid solution cubic ZrO_2 structure with approximately 2 at.% nitrogen incorporation, c-(Zr,Cr)(O,N)_2. iii) coatings with a higher Zr concentration (i.e. grown at the Zr-rich side of the target) grew in mixed-phase monoclinic and tetragonal structure, incorporating up to 2.3 at.% nitrogen, m + t-(Zr,Cr)(O,N)_2. These coating structures developed over a wide range of oxygen and nitrogen gas flow settings and substrate positions. It indicates that oxygen determines the microstructure evolution under the chosen experimental conditions, and only little nitrogen contents can be incorporated into these oxide structures. For high nitrogen gas flows (i.e. N_2/(N_2 + O_2) >0.75) this situation changed significantly, and only coatings with facecentered- cubic CrN structures were grown. These contained up to 11.4 at.% oxygen and were clearly understoichiometric in the non-metal sites. All deposited coatings exhibited hardness values between 15 GPa and 27 GPa, indicating their suitability as protective coatings.
机译:Cr-Zr-O-N体系中的薄膜通过反应射频沉积。在各种氩-氧-氮等离子体中,在500°C的基板温度下进行磁控溅射。通过实验组合方法实现沉积:将五个基板线性放置在由金属Cr和Zr半板组成的圆形分段靶的前面。因此,涂覆的样品表现出不同的元素组成(关于它们相对于靶半板的位置,即从富Cr到富Zr)和组成。除了Cr / Zr浓度比的影响(主要由样品相对于靶材的位置决定)外,还研究了反应性气体(即氧气和氮气)对相形成,微结构演变,硬度和杨氏模量的影响。为此目的,系统地改变了O_2和N_2气流,同时使所有沉积的总气压保持恒定。通过电子探针显微分析(EPMA),X射线衍射(XRD)和显微压痕对涂层进行表征。根据样品位置和反应气体流量比,生长出具有不同相的涂层:i)具有高Cr /(Cr + Zr)浓度比的涂层(即在靶材的富Cr侧生长)相固溶刚玉结构,含氮量高达1.9 at。%(Cr,Zr)_2(O,N)_3。 ii)具有相似的Cr和Zr浓度(即在靶材的中心位置生长)的涂层表现出单相固溶立方ZrO_2结构,其中氮掺入量约为2 at。%,c-(Zr,Cr)(O,N )_2。 iii)具有较高Zr浓度的涂层(即在靶材的富Zr侧生长)以混合相单斜晶和四方晶结构生长,并掺入高达2.3 at。%的氮,m + t-(Zr,Cr)( O,N)_2。这些涂层结构在各种氧气和氮气流量设置以及基材位置上都有发展。这表明氧决定了所选实验条件下的微观结构演变,只有很少的氮含量可以掺入这些氧化物结构中。对于高氮气流量(即N_2 /(N_2 + O_2)> 0.75),这种情况发生了显着变化,并且仅生长了具有面心立方CrN结构的涂层。它们含有高达11.4 at。%的氧气,并且在非金属位置明显低于化学计量比。所有沉积的涂层均显示出介于15 GPa和27 GPa之间的硬度值,表明它们适合用作保护性涂层。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号