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Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas

机译：在空气存在下使用反应性不平衡磁控溅射制备的氮氧化物薄膜的生长和表征作为反应气体

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1. Characterisation of reactive unbalanced magnetron sputtered chromium oxynitride thin films with air [J] . Agouram S, Bodart F, Terwagne G Surface & Coatings Technology . 2004,第0期

机译：空气反应性不平衡磁控溅射氧氮化铬薄膜的表征
2. Growth And Characterization Of Nanostructured Anatase Phase Tio_2 Thin Films Prepared By Dc Reactive Unbalanced Magnetron Sputtering [J] . Surasing Chaiyakun, Artorn Pokaipisit, Pichet Limsuwan, Applied Physics A: Materials Science & Processing . 2009,第2期

机译：Dc反应性不平衡磁控溅射制备纳米结构锐钛矿相Tio_2薄膜的生长与表征
3. Growth and Characterization of Zinc Oxynitride Thin Films by Reactive Gas-Timing RF Magnetron Sputtering [J] . Don Klaitabtim, Sirapat Pratontep, Jiti Nukeaw Japanese Journal of Applied Physics. Part 2, Letters & Express Letters . 2008,第1Issue2期

机译：反应气定时射频磁控溅射生长氧氮化锌薄膜及其表征
4. The Effect of Growth Conditions on the Surface Energy, Optical Properties and Saline Corrosion Resistance of Amorphous Chromium Oxide Thin Films Prepared by Reactive Magnetron Sputtering [C] . A.M. Oje, A.A. Ogwu, J. Kavanagh, Society of Vacuum Coaters annual technical conference . 2015

机译：生长条件对反应磁控溅射非晶态氧化铬薄膜表面能，光学性能和耐盐腐蚀性的影响
5. Aluminium nitride piezoelectric thin films reactively deposited in closed field unbalanced magnetron sputtering for elevated temperature 'smart' tribological applications. [D] . Hasheminiasari, Masood. 2013

机译：在高温“智能”摩擦应用中，在封闭场不平衡磁控溅射中反应性沉积的氮化铝压电薄膜。
6. Surface Properties of Nanostructured Porous ZnO Thin Films Prepared by Direct Current Reactive Magnetron Sputtering [O] . Monika Kwoka, Barbara Lyson-Sypien, Anna Kulis, 2018

机译：直流反应磁控溅射制备纳米结构多孔ZnO薄膜的表面性能
7. The growth of a multi-principal element (CoCrFeMnNi) oxynitride film by direct current magnetron sputtering using air as reactive gas [O] . G. Radnóczi, R. Dedoncker, G.Z. Radnóczi, 2021

机译：使用空气作为反应气体直接电流磁控溅射的多主元素（COCRFEMNNI）氮氧化物膜的生长

Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas

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