首页> 外文期刊>The Journal of Chemical Physics >Near-edge band structures and band gaps of Cu-based semiconductors predicted by the modified Becke-Johnson potential plus an on-site Coulomb U
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Near-edge band structures and band gaps of Cu-based semiconductors predicted by the modified Becke-Johnson potential plus an on-site Coulomb U

机译:通过修正的Becke-Johnson势加上现场库仑U预测的铜基半导体的近边缘带结构和带隙

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摘要

Diamond-like Cu-based multinary semiconductors are a rich family of materials that hold promise in a wide range of applications. Unfortunately, accurate theoretical understanding of the electronic properties of these materials is hindered by the involvement of Cu d electrons. Density functional theory (DFT) based calculations using the local density approximation or generalized gradient approximation often give qualitative wrong electronic properties of these materials, especially for narrow-gap systems. The modified Becke-Johnson (mBJ) method has been shown to be a promising alternative to more elaborate theory such as the GW approximation for fast materials screening and predictions. However, straightforward applications of the mBJ method to these materials still encounter significant difficulties because of the insufficient treatment of the localized d electrons. We show that combining the promise of mBJ potential and the spirit of the well-established DFT + U method leads to a much improved description of the electronic structures, including the most challenging narrow-gap systems. A survey of the band gaps of about 20 Cu-based semiconductors calculated using the mBJ + U method shows that the results agree with reliable values to within ±0.2 eV.
机译:类金刚石的基于铜的多元半导体是一种材料丰富的家族,在广泛的应用中具有广阔的前景。不幸的是,Cu d电子的介入阻碍了对这些材料的电子特性的准确理论理解。使用局部密度近似或广义梯度近似的基于密度泛函理论(DFT)的计算通常会给这些材料定性的错误电子性质,尤其是对于窄间隙系统。改进的Becke-Johnson(mBJ)方法已被证明是更精细的理论(如用于快速材料筛选和预测的GW近似)的有希望的替代方法。但是,由于对局部d电子的处理不充分,将mBJ方法直接应用于这些材料仍然遇到很大困难。我们表明,结合mBJ的潜力和成熟的DFT + U方法的精神,可以使电子结构的描述大大改善,包括最具挑战性的窄间隙系统。对使用mBJ + U方法计算出的大约20种铜基半导体的带隙进行的调查显示,结果与可靠值相符,误差在±0.2 eV之内。

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