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Interference effects in the sum frequency generation spectra of thin organic films. I. Theoretical modeling and simulation

机译:有机薄膜总和频率产生频谱中的干扰效应。一,理论建模与仿真

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A general theoretical calculation is described for predicting the interference effect in the sum frequency generation (SFG) spectra from a model thin-film system as a function of film thickness. The calculations were carried out for a three-layer thin film consisting of an organic monolayer, a dielectric thin film of variable thickness, and a gold substrate. This system comprises two sources of SFG, namely, a resonant contribution from the monolayer/dielectric film interface and a nonresonant contribution from the dielectric film/gold interface. The calculation shows that both the spectral intensity and the shape of the SFG spectra vary significantly with the thickness of the dielectric layer due to interference effects in the thin film. The intensity changes at a particular frequency were explained in terms of the changes in the local field factors (L factors) as a function of the dielectric film thickness. The L factor for each beam changes periodically with the thickness of the dielectric film. However, the combined L factor for the three beams shows complicated thickness dependent features and no clear periodicity was found. On the other hand, if the susceptibilities of both the resonant and nonresonant terms are fixed, changes in the spectral shape will be mainly due to changes in the phase differences between the two terms with the film thickness. The interference behavior also depends strongly on the polarization combinations of the sum frequency, visible, and infrared beams. A general method is provided for predicting changes in the spectral shapes at different film thicknesses by taking into account the relative intensities and phases of the SFG signals from the two interfaces. The model calculation provides important insights for understanding the nonlinear optical responses from any thin-film system and is an essential tool for quantitatively revealing the nonlinear susceptibilities, which are directly related to the actual structure of the interfacial molecules from the observed SFG spectra after quantitative removal of the L factors.
机译:描述了用于预测来自模型薄膜系统的总频率生成(SFG)光谱中的干扰效应与膜厚的函数关系的通用理论计算。对于由有机单层,可变厚度的电介质薄膜和金基板组成的三层薄膜进行计算。该系统包括SFG的两个来源,即来自单层/介电膜界面的共振贡献和来自介电膜/金界面的非共振贡献。计算表明,由于薄膜中的干涉效应,光谱强度和SFG光谱的形状随介电层的厚度而显着变化。根据局部场因子(L因子)随介电膜厚度变化的变化,说明了特定频率下的强度变化。每个束的L因子随着电介质膜的厚度而周期性地变化。但是,三个光束的组合L因子显示了复杂的厚度依赖性特征,并且没有发现明显的周期性。另一方面,如果谐振和非谐振项的磁化率都固定,则频谱形状的变化将主要是由于两个项之间的相位差随膜厚的变化而引起的。干扰行为还强烈取决于总和频率,可见光束和红外光束的偏振组合。通过考虑来自两个界面的SFG信号的相对强度和相位,提供了一种预测不同薄膜厚度下光谱形状变化的通用方法。该模型计算为理解任何薄膜系统的非线性光学响应提供了重要的见解,并且是定量揭示非线性磁化率的重要工具,非线性磁化率与定量去除后观察到的SFG光谱中界面分子的实际结构直接相关的L因子。

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