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Cross sections for electron trapping by DNA and its component subunits I:Condensed tetrahydrofuran deposited on Kr

机译:DNA及其组成亚基捕获电子的截面I:沉积在Kr上的缩合四氢呋喃

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We report cross sections for electron capture processes occurring in condensed tetrahydrofuran (THF)for incident electron energies in the range of 0-9 eV.The charge trapping cross section for 6-9 eV electrons is very small,and an upper limit of 4 X 10~(19)cm~2 is estimated from our results.This latter is thus also an upper bound for the cross section for dissociative electron attachment process that is known to occur at these energies for condensed THF.At energies close to zero eV electron trapping proceeds via intermolecular stabilization.The cross section for this process is strongly dependent on the quantity of deposited THF.Since THF may model the furyl ring found in deoxyribose,these measurements indicate that this ring likely plays little role in either initiating or enhancing strand break damage via the attachment of the low energy secondary electrons produced when DNA is exposed to ionizing radiation.
机译:我们报告了冷凝四氢呋喃(THF)中入射电子能量在0-9 eV范围内发生的电子俘获过程的截面.6-9 eV电子的电荷俘获截面非常小,上限为4 X根据我们的结果估算出10〜(19)cm〜2,因此后者也是解离电子附着过程的横截面的上限,已知在这些能量下会发生冷凝的THF。在接近零eV电子的能量下通过分子间稳定来捕获。此过程的横截面很大程度上取决于沉积的THF量。由于THF可以模拟脱氧核糖中的呋喃环,因此这些测量表明该环可能在引发或增强链断裂中几乎没有作用当DNA暴露于电离辐射时产生的低能二次电子的附着会造成损伤。

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