Reinvestigation of CS_2 dissociation at 193 nm by means of product state-selective vacuum laser ionization and velocity imaging

摘要

A branching ratio of 1.6+-0.3 for S(~3P)/S(~1D) is obtained for the dissociation of CS_2 with very low fluence 193 nm laser (less than 2 mJ/cm~2),in which the S(~3P) and S(~1D) have been state-selective ionized suing VUV lasers at different wavelengths.The anisotropy parameters beta_(max)(~3P)=0.8 and beta_(max)(~1D)=1.9 indicate that these channels are preferentially populated at different geometries and the lfietime is very short.