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首页> 外文期刊>The Journal of Chemical Physics >Adsorption and reaction of sulfur oxide with Cu(110) and Cu(I110)-p(2X1)-O
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Adsorption and reaction of sulfur oxide with Cu(110) and Cu(I110)-p(2X1)-O

机译:氧化硫与Cu(110)和Cu(I110)-p(2X1)-O的吸附和反应

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On Cu(110)-p(2X1)-O at 300 K SO_2(g) reacts stoichiometrically with O(a) to form a surface covered with both c(4X2)-SO_3 structures. With heating SO_2(g) evolves from the surface in distinct reaction-limited states at 384 K, 425 K, and 470 K, and the surface reverts to its initially oxidized state. On Cu(110), SO_2(g) adsorbs molecularly below 300 K; upon annealing to 300 K, the sulfur dioxide disproportionates according to 3SO_2(a) -> 2SO_3 (a) with concomitant desorption of excess SO_2 (a). The surface formed in this manner exhibits large c(2X2)-S domains which encompass scattered c(4X2)-SO_3 and p(2X2)-SO_3 structures in a 1:2 coverage ratio. After being annealed to 400 K, the surface exhibits large p(2X2)-SO_3 domains surrounding smaller c(4X2)-SO_3 and c(2X2)-S islands. Contained heating past 400 K results in decomposition of sulfite according to SO_3(a)->SO_2(g)+O(a), evolving sulfur dioxide at 470 K and leaving the surface covered with atomic sulfur and oxygen. Real-time STM images show the mobility of oxygen at island boundaries and the mobility of sulfite amid the p(2X1)-O structures. STM measurements suggest that the sulfide occupy four-fold hollow sites.
机译:在300 K的Cu(110)-p(2X1)-O上,SO_2(g)与O(a)发生化学计量反应,形成一个被c(4X2)-SO_3结构覆盖的表面。加热后,SO_2(g)以384 K,425 K和470 K在不同的反应受限状态下从表面逸出,并且表面恢复为初始氧化态。在Cu(110)上,SO_2(g)在300 K以下分子吸附;退火至300 K后,二氧化硫按照3SO_2(a)-> 2SO_3(a)歧化,同时伴随有过量SO_2(a)的解吸。以这种方式形成的表面表现出大的c(2X2)-S结构域,该结构域以1:2的覆盖率包含分散的c(4X2)-SO_3和p(2X2)-SO_3结构,退火至400 K后,表面呈现出较大的p(2X2)-SO_3域围绕较小的c(4X2)-SO_3和c(2X2)-S岛。加热超过400 K会导致亚硫酸盐根据SO_3(a)-> SO_2(g)+ O( a),在470 K处释放出二氧化硫,并在其表面覆盖有原子硫和氧,实时STM图像显示了p(2X1)-O结构中氧在岛边界处的迁移率和亚硫酸盐的迁移率。这表明硫化物占据了四个空心位置。

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