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首页> 外文期刊>Physical Review, B. Condensed Matter >Smoluchowski ripening and random percolation in epitaxial Si1-xGex/Si(001) islands - art. no. 045315
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Smoluchowski ripening and random percolation in epitaxial Si1-xGex/Si(001) islands - art. no. 045315

机译:外延Si1-xGex / Si(001)岛中的Smoluchowski成熟和随机渗滤-艺术。没有。 045315

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摘要

Island size distributions of ripened Si1-xGex/Si(001) (x = 0.3 - 0.7) islands exhibit a slow decay at small island sizes and an asymmetric bell-shaped distribution peaked at a large size. We explain the ripening process in Si1-xGex/Si(001) islands by proposing a model based on random percolation and Smoluchowski ripening. Drawing an analogy with percolation theory, we use a shifted average height to represent the time variable, which is also applicable in the Smoluchowski ripening model; this shifted average height is used to analyze size distributions and correlation functions. Critical exponents derived from the site percolation model at d = 3 agree with our measurements, Island diffusion Dproportional tos(-alpha) leading to coalescence events, shows a weak dependence on size s: alpha = 0.28 +/- 0.20, attributable to the inverse process of sequential incorporation of atoms at step edges due to the high stress concentration at island terrace perimeters. While random percolation dominates for small sizes regime, Smoluchowski ripening controls the distribution peak at large island sizes. Good agreement is obtained between the model and the measured island size distributions. [References: 35]
机译:成熟的Si1-xGex / Si(001)(x = 0.3-0.7)岛的岛尺寸分布在小岛尺寸下显示出缓慢的衰减,而在大尺寸岛上出现不对称的钟形分布。通过提出基于随机渗流和Smoluchowski成熟的模型,我们解释了Si1-xGex / Si(001)岛中的成熟过程。类似于渗流理论,我们使用移动的平均高度来表示时间变量,这也适用于Smoluchowski成熟模型。偏移后的平均高度用于分析尺寸分布和相关函数。在d = 3时从站点渗流模型得出的临界指数与我们的测量结果相符,导致扩散事件的岛扩散D比例tos(-alpha)显示出对尺寸s的弱依赖性:alpha = 0.28 +/- 0.20,可归因于由于在岛阶周长处的高应力集中,在台阶边缘顺序引入原子的过程。虽然随机渗滤在小尺寸区域占主导地位,但Smoluchowski成熟控制着大岛尺寸处的分布峰。在模型和测得的岛屿尺寸分布之间获得了良好的一致性。 [参考:35]

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