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Dynamic vortex instabilities in Ta/Ge-based multilayers and thin films with various pinning strengths

机译:具有不同钉扎强度的Ta / Ge基多层和薄膜中的动态涡旋不稳定性

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We report measurements of a dynamic instability in the moving vortex system of Ta/Ge-based thin films and multilayers. The instability results from a nonequilibrium distribution of quasiparticles induced by motion of the vortex cores, as described theoretically by Larkin and Ovchinnikov in the regime where there is no pinning. For the Ta/Ge system, where the critical vortex velocity is relatively small, we observe the instability in cases where either the viscosity or pinning dominate the vortex motion. We develop a simple model to describe the effects of pinning on the flux motion near the instability, and show that it gives a good description of the experimental data, especially in fields not too close to ten. The temperature dependence of the critical vortex velocity extracted from the analysis indicates that electron-electron scattering provides the dominant contribution to the energy relaxation. [References: 22]
机译:我们报告了基于Ta / Ge的薄膜和多层膜的运动涡旋系统中动态不稳定性的测量结果。这种不稳定性是由于涡旋核运动引起的准粒子的不平衡分布所致,正如Larkin和Ovchinnikov在没有钉扎状态下理论上所描述的那样。对于临界涡旋速度相对较小的Ta / Ge系统,在粘度或钉扎主导旋涡运动的情况下,我们观察到了不稳定性。我们开发了一个简单的模型来描述钉扎对不稳定附近磁通运动的影响,并表明它可以很好地描述实验数据,尤其是在距离不太近的十个领域。从分析中提取的临界涡旋速度与温度的关系表明,电子-电子散射为能量弛豫提供了主要作用。 [参考:22]

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