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Si/Sb superlattice-like thin films for ultrafast and low power phase change memory application

机译:Si / Sb类超晶格薄膜,用于超快速和低功耗相变存储应用

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After compositing with Si, the superlattice-like (SLL) Si/Sb thin film had higher crystallization temperature (similar to 231 degrees C), larger crystallization activation energy (2.95 eV), and better data retention ability (126 degrees C for 10 years). The crystallization of Sb in SLL Si/Sb thin films was restrained by the multilayer interfaces. The reversible resistance transition could be achieved by an electric pulse as short as 10 ns for [Si(22 nm)/Sb(2 nm)](2)-based PCM cell. A lower operation power consumption of 0.02 mW and a good endurance of 1.0 x 10(5) cycles were achieved. In addition, SLL [Si(22 nm)/Sb(2 nm)](2) thin film showed a low thermal conductivity of 0.11 W/(m.K). (C) 2016 Elsevier B.V. All rights reserved.
机译:与硅复合后,超晶格状(SLL)Si / Sb薄膜具有更高的结晶温度(约231摄氏度),更大的结晶活化能(2.95 eV)和更好的数据保持能力(126摄氏度,持续10年) )。 SLL Si / Sb薄膜中Sb的结晶受到多层界面的限制。对于基于[Si(22 nm)/ Sb(2 nm)](2)的PCM单元,可通过短至10 ns的电脉冲实现可逆电阻转换。实现了较低的0.02 mW的工作功耗和1.0 x 10(5)个周期的良好耐久性。另外,SLL [Si(22nm)/ Sb(2nm)](2)薄膜显示出0.11W /(m.K)的低热导率。 (C)2016 Elsevier B.V.保留所有权利。

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