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Compositionally matched nitrogen-doped Ge2Sb2Te5/Ge2Sb2Te5 superlattice-like structures for phase change random access memory

机译:组成匹配的氮掺杂Ge2Sb2Te5 / Ge2Sb2Te5超晶格状结构,用于相变随机存取存储器

摘要

A compositionally matched superlattice-like (SLL) structure comprised of Ge2Sb2Te5 (GST) and nitrogen-doped GST (N-GST) was developed to achieve both low current and high endurancePhase Change Random Access Memory (PCRAM). N-GST/GST SLL PCRAM devices demonstrated ∼37% current reduction compared to single layered GST PCRAM and significantly higher write/erase endurances of ∼108 compared to ∼106 for GeTe/Sb2Te3 SLL devices. The improvements in endurance are attributed to the compositionally matched N-GST/GST material combination that lowers the diffusion gradient between the layers and the lower crystallization-induced stress in the SLL as revealed by micro-cantilever stress measurements.
机译:开发了由Ge2Sb2Te5(GST)和氮掺杂GST(N-GST)组成的成分匹配的超晶格状(SLL)结构,以实现低电流和高耐久性相变随机存取存储器(PCRAM)。与单层GST PCRAM相比,N-GST / GST SLL PCRAM器件的电流降低了约37%,与GeTe / Sb2Te3 SLL器件的约106相比,N / GST / GST SLL PCRAM器件的写入/擦除耐力显着提高了约108。耐久性的提高归因于组成匹配的N-GST / GST材料组合,该组合降低了层之间的扩散梯度,并降低了微悬臂梁应力测量所揭示的SLL中较低的结晶诱导应力。

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