We report on an 800 nm center-wavelength metal/multilayer-dielectric grating (MMDG) with broadband, high diffraction efficiency. The trapezoidal grating ridge consists of an HfO_2 layer sandwiched between two SiO_2 films. Combining the advantages of SiO_2 and HfO_2, the grating ridge reduces the difficulties of grating ridge attainment. For such a configuration, high-performance MMDG can be successfully fabricated using the existing technology. Experimentally we demonstrated a 163 nm bandwidth MMDG with -1st-order diffraction efficiency greater than 90%. The fabricated MMDG achieved high performance as the design with large fabrication tolerances.
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