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Elastic, Adhesive, and Charge Transport Properties of a Metal-Molecule-Metal Junction: The Role of Molecular Orientation, Order, and Coverage

机译:金属-分子-金属结的弹性,粘合和电荷传输性质:分子取向,顺序和覆盖范围的作用

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The elastic, adhesive, and charge transport properties of a metal-molecule-metal junction were studied via conductingprobe atomic forcemicroscopy (AFM) and correlated with molecular structure by near-edgeX-ray absorption fine structure (NEXAFS) spectroscopy. The junctions consisted of Co-Cr-coated AFM tips in contact with methyl-terminated alkanethiols (CH3(CH2)n-1SH, denoted by Cn, where n is the number of carbons in the molecular chain) on Au substrates. AFM contact data were analyzed with the Derjaguin-Muller-Toporov contact model, modified by a first-order elastic perturbation method to account for substrate effects, and a parabolic tunneling model, appropriate for a metal-insulatormetal junction in which the thickness of the insulator is comparable to the Fermi wavelength of the conducting electrons. NEXAFS carbon K-edge spectra were used to compute the dichroic ratio RI for each film, which provided a quantitative measure of the molecular structure as a function of n. As n decreased from 18 to 5, there was a change in themolecular phase from crystalline to amorphous (RIf0) and loss of surface coverage, and as a result, the work of adhesion w increased from 82.8 mJm-2 to 168.3mJm-2, the Young’s modulus of the filmEfilm decreased from 1.0 to 0.15 GPa, and the tunneling barrier height φ0-EF decreased from 2.4 to 2.1 eV. For all n, the barrier thickness t decreased for small applied loads F and remained constant at~2.2 nmfor large F. The change in behavior was explained by the presence of two insulating layers: an oxide layer on the Co-Cr tip, and the alkanethiol monolayer on the Au surface. X-ray photoelectron spectroscopy confirmed the presence of an oxide layer on the Co-Cr tip, and by performing high-resolution region scans through the film, the thickness of the oxide layer toxide was found to be between 1.9 and 3.9 nm. Finally, it was shown that φ0 - EF is strain-dependent, and the strain at which the film is completely displaced from under the tip is -0.17 for all values of n.
机译:通过导电探针原子力显微镜(AFM)研究了金属-分子-金属接合处的弹性,粘合和电荷传输性质,并通过近边缘X射线吸收精细结构(NEXAFS)光谱将其与分子结构相关联。接合处由与Au底物上甲基封端的链烷硫醇(CH3(CH2)n-1SH,用Cn表示,其中n是分子链中碳数)接触的Co-Cr涂层AFM尖端组成。 AFM接触数据使用Derjaguin-Muller-Toporov接触模型(通过一阶弹性微扰方法修改以考虑衬底效应)和抛物线隧穿模型进行分析,该抛物线隧穿模型适用于绝缘体厚度为金属-绝缘体的金属结与导电电子的费米波长相当。 NEXAFS碳K边缘光谱用于计算每个膜的二色性比RI,这提供了作为n的函数的分子结构的定量度量。当n从18降低到5时,分子相从结晶态变为非晶态(RIf0),并且表面覆盖率降低,结果,粘附力w从82.8 mJm-2增大到168.3mJm-2, filmEfilm的杨氏模量从1.0 GPa降至0.15 GPa,隧穿势垒高度φ0-EF从2.4 eV降至2.1 eV。对于所有n,势垒厚度t在较小的施加载荷F下减小,而对于较大的F则保持恒定在〜2.2 nm。行为的变化可以通过存在两个绝缘层来解释:Co-Cr尖端上的氧化物层和Au表面上的烷硫醇单层。 X射线光电子能谱法证实了在Co-Cr尖端上存在氧化层,并且通过对薄膜进行高分辨率区域扫描,发现氧化层toxide的厚度在1.9至3.9nm之间。最后,表明φ0-EF与应变有关,并且对于所有n值,薄膜从尖端下方完全移位的应变为-0.17。

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