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Effect of coupling ability between a synthetic antiferromagnetic layer and pinned layer on a bridging layer of Ta, Ti, and Pt in perpendicular-magnetic tunnel junctions

机译:垂直磁隧道结中Ta,Ti和Pt桥接层上合成反铁磁层与固定层之间耦合能力的影响

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By fabricating CoFeB/MgO/CoFeB-based perpendicular-magnetic tunnel junction (p-MTJ) spin-valves stacked with a [Co/Pd](n)-SyAF layer based on a TiN bottom electrode on a 12 inch Si wafer (001) substrate, we investigated how the bridging layers of Ta, Ti, and Pt and their thickness variation affected the tunneling magneto-resistance (TMR) ratio of Co2Fe6B2 pinned-layer behavior in magnetic-tunnel-junctions. TMR ratios for Ta, Ti, and Pt bridging layers were observed to be 64.1, 70.2, and 29.5%, respectively. It was confirmed by high resolution transmission electron microscopy (HR-TEM) that this difference resulted from CoFeB/MgO/CoFeB MTJ layers with Ta and Ti bridging layers being textured well with a bcc (100) structure, indicating that Ta and Ti bridging layers bridged SyAF fcc (111) and MTJ bcc (100). On the other hand, the MTJ layer with Pt bridging layer was incorrectly textured, indicating that a Pt bridging layer is unsuitable to bridge SyAF fcc (111) and MTJ bcc (100) due to Pt being diffused into the CoFeB pinned-layer. In addition, perpendicular magnetic anisotropy (PMA) behavior of the CoFeB pinned-layer was found to depend strongly on a bridging layer thickness; higher TMRs of Ta and Ti were observed at the optimal bridging layers' thickness, which enable the realization of PMAs of the pinned-layer and ferro-coupling of the pinned-layer with the lower-SyAF layer. Among the three bridging materials (Ta, Ti, and Pt), we observed that Ti showed the highest TMR ratio and widest thickness range for a high TMR ratio, indicating that a higher TMR ratio is needed to obtain the best deposition process margin.
机译:通过制造基于CoFeB / MgO / CoFeB的垂直磁隧道结(p-MTJ)自旋阀,该自旋阀与基于12英寸Si晶片的TiN底部电极的[Co / Pd](n)-SyAF层堆叠在一起(001 )衬底,我们研究了Ta,Ti和Pt的桥接层及其厚度变化如何影响Co2Fe6B2固定层在磁隧道结中的隧穿磁阻(TMR)比。 Ta,Ti和Pt桥接层的TMR比分别为64.1、70.2和29.5%。高分辨率透射电子显微镜(HR-TEM)证实了这种差异是由于具有Ta和Ti桥接层的CoFeB / MgO / CoFeB MTJ层具有良好的bcc(100)结构织构,表明Ta和Ti桥接层桥接SyAF fcc(111)和MTJ bcc(100)。另一方面,带有Pt桥接层的MTJ层的纹理不正确,表明Pt桥接层不适合桥接SyAF fcc(111)和MTJ bcc(100),因为Pt扩散到了CoFeB固定层中。此外,发现CoFeB固定层的垂直磁各向异性(PMA)行为在很大程度上取决于桥接层的厚度。在最佳桥接层厚度处,观察到Ta和Ti的TMR较高,从而可以实现固定层的PMA以及固定层与较低SyAF层的铁耦合。在三种桥接材料(Ta,Ti和Pt)中,我们观察到,对于高TMR比,Ti表现出最高的TMR比和最宽的厚度范围,这表明需要更高的TMR比才能获得最佳的沉积工艺余量。

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