During the last decade, focused ion beam processing has been developed from traditionally used Ga+ liquid ion sources towards higher resolution gas field ion sources (He+ and Ne+). Process simulations not only improve the fundamental understanding of the relevant ionmatter interactions, but also enable a certain predictive power to accelerate advances. The historic 'gold' standard in ion-solid simulations is the SRIM/TRIM Monte Carlo package released by Ziegler, Ziegler and Biersack 2010 Nucl. Instrum. Methods B 268 1818-23. While SRIM/ TRIM is very useful for a myriad of applications, it is not applicable for the understanding of the nanoscale evolution associated with ion beam nano-machining as the substrate does not evolve with the sputtering process. As a solution for this problem, a new, adapted simulation code is briefly overviewed and finally addresses these contributions. By that, experimentally observed Ne+ beam sputter profiles can be explained from a fundamental point of view. Due to their very good agreement, these simulations contain the potential for computer aided optimization towards predictable sputter processes for different nanotechnology applications. With these benefits in mind, the discussed simulation approach represents an enormous step towards a computer based master tool for adaptable ion beam applications in the context of industrial applications.
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