Multi-eigenmode control for high material contrast in bimodal and higher harmonic atomic force microscopy

摘要

High speed imaging and mapping of nanomechanical properties in atomic force microscopy (AFM) allows the observation and characterization of dynamic sample processes. Recent developments involve several cantilever frequencies in a multifrequency approach. One method actuates the first eigenmode for topography imaging and records the excited higher harmonics to map nanomechanical properties of the sample. To enhance the higher frequencies' response two or more eigenmodes are actuated simultaneously, where the higher eigenmode(s) are used to quantify the nanomechanics. In this paper, we combine each imaging methodology with a novel control approach. It modifies the Q factor and resonance frequency of each eigenmode independently to enhance the force sensitivity and imaging bandwidth. It allows us to satisfy the different requirements for the first and higher eigenmode. The presented compensator is compatible with existing AFMs and can be simply attached with minimal modifications. Different samples are used to demonstrate the improvement in nanomechanical contrast mapping and imaging speed of tapping mode AFM in air. The experiments indicate most enhanced nanomechanical contrast with low Q factors of the first and high Q factors of the higher eigenmode. In this scenario, the cantilever topography imaging rate can also be easily improved by a factor of 10.