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首页> 外文期刊>Nanotechnology >Local nanotip arrays sculptured by atomic force microscopy to enhance the lightoutput efficiency of GaN-based light-emitting diode structures
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Local nanotip arrays sculptured by atomic force microscopy to enhance the lightoutput efficiency of GaN-based light-emitting diode structures

机译:通过原子力显微镜雕刻的局部纳米尖端阵列可提高GaN基发光二极管结构的光输出效率

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In this work, local nanotip arrays on GaN-based light-emitting (LED) structures were fabricated through nano-oxidation using an atomic force microscope (AFM). The photoluminescence (PL) intensity of the InGaN/GaN multiple quantum wells (MQWs) active layer and the light extraction efficiency of the LED structure were enhanced by forming this nanotips structure to serve as a graded-refractive index layer, which is further validated by the finite-difference timedomain analysis. The PL emission peak of the MQWs active layer has a blue-shift phenomenon that is caused by a partial reduction of the strain on the InGaN well. It is expected that our approach opens a promising route for simultaneously enhancing both the internal quantum efficiency and the light extraction efficiency of GaN-based LEDs. The proposed AFM-based method will be of importance for local patterning the light emitting components for optoelectronic applications.
机译:在这项工作中,使用原子力显微镜(AFM)通过纳米氧化,在GaN基发光(LED)结构上制造了局部纳米尖端阵列。通过形成该纳米尖端结构以用作渐变折射率层,可以增强InGaN / GaN多量子阱(MQWs)有源层的光致发光(PL)强度和LED结构的光提取效率,这进一步得到了验证。时域有限差分分析。 MQWs有源层的PL发射峰具有蓝移现象,这是由于InGaN阱上的应变的部分降低而引起的。期望我们的方法为同时提高GaN基LED的内部量子效率和光提取效率开辟一条有希望的途径。所提出的基于AFM的方法对于对光电应用的发光组件进行局部构图非常重要。

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