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Enhanced first-order Raman scattering from arrays of vertical silicon nanowires

机译:来自垂直硅纳米线阵列的增强的一阶拉曼散射

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摘要

Vertical ordered silicon nanowire arrays with diameters ranging from 30 to 60nm are fabricated and display enhanced Raman scattering. The first-order 520cm ~1 phonon mode shows no significant shift or peak broadening with increasing laser power, suggesting that the excellent defect-free diamond crystalline structure and thermal properties of bulk silicon are maintained. The Raman enhancement per unit volume of the first-order phonon peak increases with increasing nanowire diameter, and has maximum enhancement factors of 7.1 and 70 when compared to the original silicon on insulator (SOI) and bulk silicon wafers, respectively. For the array with 60nm diameter nanowires, the total Raman intensity is larger than that of the SOI wafer. The results are understood using a model based on the confinement of light and are supported by finite difference time domain (FDTD) simulations.
机译:制造直径范围为30至60nm的垂直有序硅纳米线阵列,并显示增强的拉曼散射。一阶520cm〜1声子模式不会随激光功率的增加而出现明显的偏移或峰展宽,表明保持了优异的无缺陷金刚石晶体结构和体硅的热性能。一阶声子峰的每单位体积的拉曼增强随纳米线直径的增加而增加,并且与原始的绝缘体上硅(SOI)和块状硅晶片相比,其最大增强因子分别为7.1和70。对于具有60nm直径纳米线的阵列,总拉曼强度大于SOI晶片的拉曼强度。使用基于光限制的模型可以理解结果,并由时差有限差分(FDTD)仿真支持。

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