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首页> 外文期刊>Nanotechnology >Dramatically enhanced ultraviolet photosensing mechanism in a n-ZnO nanowires/i-MgO-Si structure with highly dense nanowires and ultrathin MgO layers
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Dramatically enhanced ultraviolet photosensing mechanism in a n-ZnO nanowires/i-MgO-Si structure with highly dense nanowires and ultrathin MgO layers

机译:具有高密度纳米线和超薄MgO层的n-ZnO纳米线/ i-MgO / n-Si结构中的戏剧性增强的紫外线光敏机制

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摘要

This study reports that the visible-blind ultraviolet (UV) photodetecting properties of ZnO nanowire based photodetectors were remarkably improved by introducing ultrathin insulating MgO layers between the ZnO nanowires and Si substrates. All layers were grown without pause by metal organic chemical vapor deposition and the density and vertical arrangement of the ZnO nanowires were strongly dependent on the thickness of the MgO layers. The sample in which an MgO layer with a thickness of 8 nm was inserted had high density nanowires with a vertical alignment and showed dramatically improved UV photosensing performance (photo-to-dark current ratio = 1344.5 and recovery time = 350ms). The photoresponse spectrum revealed good visible-blind UV detectivity with a sharp cut off at 378nm and a high UV/visible rejection ratio. A detailed discussion regarding the developed UV photosensing mechanism from the introduction of the i-MgO layers and highly dense nanowires in the n-ZnO nanowires/i-MgO-Si substrates structure is presented in this work.
机译:这项研究报告指出,通过在ZnO纳米线和Si衬底之间引入超薄绝缘MgO层,可以显着改善ZnO纳米线基光电探测器的可见盲紫外(UV)光电探测性能。所有层均通过金属有机化学气相沉积而无中断地生长,并且ZnO纳米线的密度和垂直排列在很大程度上取决于MgO层的厚度。插入厚度为8 nm的MgO层的样品具有垂直排列的高密度纳米线,并显示出显着改善的UV光敏性能(光暗电流比= 1344.5,恢复时间= 350ms)。光响应光谱显示出良好的可见盲UV探测性,在378nm处有一个陡峭的截止点,并且具有很高的UV /可见光拒绝率。在这项工作中,详细介绍了通过在i-MgO层和i-MgO / n-Si衬底结构中引入i-MgO层和高密度纳米线而开发的UV光敏机理。

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