NiCu/Cu多层纳米线微、纳结构及成份研究

摘要

NiCu/Cu multilayer nanowires have been successfully fabricated by a pulse electrodeposition technique into the channels of nanoporous anodic aluminum oxide ( AAO ) templates, and their morphology, chemistry and crjsiai structure have been characterized at the nanoscale. It is found lhat individual multilayer nanowires have a regular periodic structure like bamboo. The average diameter of NiCu/Cu multilayer nanowires was approximately 53 nm. EDS line scan and EDS elemental mappings revealed that individual multilayer nanowires contained an alternating NiCu and Cu layers, and the growth rale was approximately 5 nm/a for NiCu layer and 2 nm/s for Cu. The chemical composition of multilayer nanowires was measured to be (Ni51 Cu49/Cu)n,. HRTEM, SAED and CBED results indicated that Ni5, Cuw/Cu multilayer nanowires were polycrystolline face centered cubic lattice structure.%采用双脉冲电化学沉积法,以多孔阳极氧化铝(AAO)为模板制备了NiCu/Cu多层纳米线.利用透射电子显微术研究其微/纳结构和成分.研究结果表明,单根NiCu/Cu纳米线尺寸均匀,平均直径为53 nm,系多晶面心立方(fcc)结构.STEM模式下EDS线扫描和EDS面分布显示多层纳米线呈现NiCu和Cu交替排列组成的多层结构,其NiCu层和Cu层的平均沉积速率分别为5 nm/s和2 nm/s.化学组分测量测定NiCu层原子比为Ni: Cu=51:49,Cu层为纯铜.并通过NiCu合金和Cu纳米线元素测定分析、验证了Ni和Cu的含量比例关系.利用HRTEM 和CBED深入表征分析了非磁性层尺度小于10 nm的NiCu/Cu纳米线的磁性层、非磁性层和过渡层结构.