AZO (ZnO:Al) Transparent Conductive Film Prepared by Plasma Enhanced Chemical Vapour Deposition and its Performances in Comparison with ZnO Film

摘要

In this paper, AZO(ZnO:Al) polycrystalline thin films have been fabricated by PECVD (plasma enhanced chemical vapour deposition) method. Based on PECVD method, the fabrication process of AZO film is shown in detail. Furthermore, the measurements of the film electro-optical properties have been bringing forth, in comparison with ZnO film. The results suggested that based on PECVD method, AZO films with strong adhesion to the substrate, as low as 89 Ω/% of square resistance and as high as 85 % of visible light transmittance have been deposited on the glass substrate and the silicon substrate, respectively.