TiO_(2)--Ta_(2)O_(5) composite thin films deposited by radio frequency ion-beam sputtering

摘要

TiO_(2)--Ta_(2)O_(5) composite films were prepared by a radio frequency ion-beam sputtering deposition process, and the refractive indices and extinction coefficients of the composite films were found to be between those of the TiO_(2) and Ta_(2)O_(5) films. The structure of the as-deposited films was amorphous, and the surface roughness was approximately 0.1 nm. The residual stress of the composite films was less than that of pure TiO_(2) film. The structure of the composite films after annealing was amorphous, with low surface roughness and slightly increased residual stress. The film containing 6.3percent TiO_(2) displayed better properties than either the pure TiO_(2) or the pure Ta_(2)O_(5) film.